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首页> 外文期刊>Science and technology of advanced materials >Present status and future prospects of spherical aberration corrected TEM/STEM for study of nanomaterialsInvited paper.
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Present status and future prospects of spherical aberration corrected TEM/STEM for study of nanomaterialsInvited paper.

机译:球面像差校正TEM / STEM在纳米材料研究中的现状与展望。

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The present status of Cs-corrected TEM/STEM is described from the viewpoint of the observation of nanomaterials. Characteristic features in TEM and STEM are explained using the experimental data obtained by our group and other research groups. Cs correction up to the 3rd-order aberration of an objective lens has already been established and research interest is focused on correcting the 5th-order spherical aberration and the chromatic aberration in combination with the development of a monochromator below an electron gun for smaller point-to-point resolution in optics. Another fundamental area of interest is the limitation of TEM and STEM resolution from the viewpoint of the scattering of electrons in crystals. The minimum size of the exit-wave function below samples undergoing TEM imaging is determined from the calculation of scattering around related atomic columns in the crystals. STEM does not have this limitation because the resolution is, in principle, determined by the probe size. One of the future prospects of Cs-corrected TEM/STEM is the possibility of extending the space around the sample holder by correcting the chromatic and spherical aberrations. This wider space will contribute to the ease of performing in situ experiments and various combinations of TEM and other analysis methods. High-resolution, in situ dynamic and 3D observations/analysis are the most important keywords in the next decade of high-resolution electron microscopy.
机译:从观察纳米材料的角度描述了经Cs校正的TEM / STEM的现状。使用我们小组和其他研究小组获得的实验数据来解释TEM和STEM中的特征。已经建立了物镜三阶像差的Cs校正,研究兴趣集中在校正五阶球面像差和色差上,并结合了电子枪下方单色仪的发展,以实现更小的点校正。光学中的点对点分辨率。从晶体中电子的散射的角度来看,另一个感兴趣的基本领域是TEM和STEM分辨率的限制。根据晶体中相关原子列周围的散射计算,可以确定进行TEM成像的样品下方出射波函数的最小尺寸。 STEM没有此限制,因为分辨率原则上由探针大小决定。 Cs校正的TEM / STEM的未来前景之一是可以通过校正色差和球差来扩展样品架周围的空间。这种较宽的空间将有助于简化原位实验以及TEM和其他分析方法的各种组合。高分辨率,原位动态和3D观察/分析是高分辨率电子显微镜未来十年中最重要的关键词。

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