首页> 外文期刊>Open Access Library Journal >Preparation of Cr&sub&2&/sub&O&sub&3&/sub&-Ta&sub&2&/sub&O&sub&5&/sub& Composites Using RF Magnetron Sputtering
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Preparation of Cr&sub&2&/sub&O&sub&3&/sub&-Ta&sub&2&/sub&O&sub&5&/sub& Composites Using RF Magnetron Sputtering

机译:制备Cr 2 / O 3 -sub-Ta 2 + / O 5-/ sub。射频磁控溅射复合材料

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We prepared Cr 2 ) O 3 ) -Ta 2 ) O 5 ) composite films using our RF magnetron co-sputtering method for the first time. X-ray diffraction (XRD) patterns and photoluminescence (PL) spectra of the films annealed at 700℃, 800℃, 900℃, and 1000℃ were evaluated. From their XRD patterns, the Cr 2 ) O 3 ) -Ta 2 ) O 5 ) film annealed at 700℃ seemed to be almost amorphous, and the one annealed at 800℃ seemed to be hexagonal Ta 2 ) O 5 ) doped with Cr. In addition, the Cr 2 ) O 3 ) -Ta 2 ) O 5 ) films annealed at 900℃ and 1000℃ seemed to include tetragonal CrTaO 4 ) phases. Furthermore, it seems that almost no defect exists in our Cr 2 ) O 3 ) -Ta 2 ) O 5 ) composite films annealed at 700℃ - 1000℃ because their PL spectra have no defect-related peak. We thus find that good-quality?Cr 2 ) O 3 ) -Ta 2 ) O 5 ) composite films including CrTaO 4 ) can?be obtained using our very simple co-sputtering method and subsequent annealing above 900℃.
机译:我们首次使用射频磁控共溅射方法制备了Cr 2)O 3)-Ta 2)O 5)复合膜。评价了在700℃,800℃,900℃和1000℃退火的薄膜的X射线衍射(XRD)图谱和光致发光(PL)光谱。从它们的X射线衍射图可以看出,在700℃退火的Cr 2)O 3)-Ta 2)O 5)薄膜几乎是非晶态的,而在800℃退火的薄膜似乎是掺杂了Cr的六角形Ta 2)O 5)。 。另外,在900℃和1000℃退火的Cr 2)O 3)-Ta 2)O 5)膜似乎包含四方CrTaO 4)相。此外,似乎我们的Cr 2)O 3)-Ta 2)O 5)复合膜在700℃-1000℃退火时几乎没有缺陷,因为它们的PL光谱没有缺陷相关峰。因此,我们发现,使用我们非常简单的共溅射方法并随后在900℃以上进行退火,可以获得包括CrTaO 4)的高质量?Cr 2)O 3)-Ta 2)O 5)复合膜。

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