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Kinetics and Mechanisms of Chalcopyrite Dissolution at Controlled Redox Potential of 750 mV in Sulfuric Acid Solution

机译:硫酸盐溶液在受控氧化还原电势为750 mV时溶解黄铜矿的动力学和机理

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To better understand chalcopyrite leach mechanisms and kinetics, for improved Cu extraction during hydrometallurgical processing, chalcopyrite leaching has been conducted at solution redox potential 750 mV, 35?¢????75 ???°C, and pH 1.0 with and without aqueous iron addition, and pH 1.5 and 2.0 without aqueous iron addition. The activation energy ( E a ) values derived indicate chalcopyrite dissolution is initially surface chemical reaction controlled, which is associated with the activities of Fe 3+ and H + with reaction orders of 0.12 and ?¢????0.28, respectively. A surface diffusion controlled mechanism is proposed for the later leaching stage with correspondingly low E a values. Surface analyses indicate surface products (predominantly S n 2?¢???? and S 0 ) did not inhibit chalcopyrite dissolution, consistent with the increased surface area normalised leach rate during the later stage. The addition of aqueous iron plays an important role in accelerating Cu leaching rates, especially at lower temperature, primarily by reducing the length of time of the initial surface chemical reaction controlled stage.
机译:为了更好地理解黄铜矿的浸出机理和动力学,为了改善湿法冶金过程中的铜萃取,在溶液氧化还原电势为750 mV,35°C≤75°C和pH 1.0的条件下(有水或无水)进行了黄铜矿浸出。添加铁,pH 1.5和2.0,不添加铁水溶液。导出的活化能(E a)值表明,黄铜矿的溶解最初是受表面化学反应控制的,这与Fe 3+和H +的活性分别具有0.12和≥0.28的反应级有关。对于随后的浸出阶段,提出了一种表面扩散控制的机制,具有较低的E a值。表面分析表明,表面产物(主要为S n2α-β-3和S 0)没有抑制黄铜矿的溶解,这与在后期增加的表面积归一化浸出率一致。铁水的添加对加速铜的浸出速率起重要作用,尤其是在较低温度下,主要是通过缩短初始表面化学反应控制阶段的时间来提高。

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