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Comparison of the phase transition and degradation of methylene blue of TiO2, TiO2/ montmorillonite mixture and TiO2/montmorillonite composite

机译:TiO2,TiO2 /蒙脱土混合物和TiO2 /蒙脱土复合物的亚甲基蓝相变和降解的比较

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Nano-TiO2 (T), TiO2/montmorillonite mixture (Mix) and TiO2/montmorillonite composite (Com) were prepared by using TiOSO4?2H2O as the precursor of TiO2 and montmorillonite as the matrix. The phase transition process of TiO2 and the degradation of methylene blue (MB) in T, Mix and Com were studied by X-ray diffraction (XRD), Infrared spectrum (IR), Scanning electron microscopy with energy spectrum (SEM-EDS) and other methods. The results show that, except the heating temperature has a great influence on the phase transition and grain growth of TiO2, the introduction of montmorillonite has an obvious inhibition effect on the phase transition and grain growth of TiO2, and the inhibition effect of the Com is obviously stronger than that of the Mix. In Com, Ti-O-Si chemical bond formed between TiO2 and oxygen atoms with negative charge on the bottom of the structure layer of montmorillonite, which is the main reason for inhibition effect. However, in Mix, TiO2 only covers the surface of montmorillonite without breaking the degree of order of montmorillonite and forming no chemical bond with montmorillonite, so the inhibition effect is small. From degradation of MB, it was found that before the structure of montmorillonite was destroyed (400-600°C), the degradation ratio in Mix (85.3-99.5%) was higher than that of T and Com. At high temperature (above 700°C), because of the inhibition effect, the degradation of MB in Com is much larger than T and Mix, even after 1100°C, the degradation rate can still reach at 47%. Therefore, in industrial applications, Mix and Com can be selected to degradation MB according to the actual application temperature range.
机译:以TiOSO4·2H2O为前驱体,以蒙脱石为基体,制备了纳米TiO2(T),TiO2 /蒙脱土混合物(Mix)和TiO2 /蒙脱土复合材料(Com)。通过X射线衍射(XRD),红外光谱(IR),能谱扫描电子显微镜(SEM-EDS)和X射线衍射(XRD)研究了TiO2在T,Mix和Com中的相变过程和亚甲基蓝(MB)的降解。其他方法。结果表明,除了加热温度对TiO2的相变和晶粒长大影响外,蒙脱石的引入对TiO2的相变和晶粒长大有明显的抑制作用,而Com对硅的抑制作用为明显比Mix强。在Com中,蒙脱石结构层底部的TiO2与氧原子之间形成带有负电荷的Ti-O-Si化学键,这是其抑制作用的主要原因。但是,在Mix中,TiO 2仅覆盖蒙脱石的表面而不破坏蒙脱石的有序度并且不与蒙脱石形成化学键,因此抑制效果小。从MB的降解,发现在破坏蒙脱石的结构(400-600℃)之前,Mix中的降解率(85.3-99.5%)高于T和Com。在高温下(高于700°C),由于具有抑制作用,因此Com中MB的降解远大于T和Mix,即使在1100°C之后,降解率仍可达到47%。因此,在工业应用中,可以根据实际应用温度范围选择Mix和Com来降解MB。

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