Tantalum Thin Film Applications – A New Approach for Capacitors

摘要

Tantalum-based materials and process developments have increased the use of tantalum films, combined with siliconintegrated circuits, to form hybrid integrated circuits which can meet the demands of telecommunication systems.This paper, after a historical review, describes the status of tantalum thin film technology used at Telettra in theimplementation of circuits for telecommunication equipment. In particular, this paper focusses on the effortsdevoted to the improvement of theβ-Ta capacitor process in terms of yield and reliability forRCactive filterrealization. The results of a new Ta2O5–βTa deposition process, where a Ta2O5layer is first formed by d.c.reactive sputtering in oxygen in the same vacuum batch where theβ-Ta film is sequentially formed, are given.