首页> 外文期刊>International Scholarly Research Notices >Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations
【24h】

Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations

机译:裕度设计和处理步骤对Captek恢复的裕度适应的影响

获取原文
获取外文期刊封面目录资料

摘要

This study examined the effect of four margin designs on marginal adaptation of Captek crowns during selected processing steps. Twenty-four Captek crowns were fabricated, six each of four margin designs: shoulder (Group A), chamfer (Group B), chamfer with bevel (Group C), and shoulder with bevel (Group D). Marginal discrepancies between crowns and matching dies were measured at selected points for each sample at the coping stage (Stage 1), following porcelain application (Stage 2) and cementation (Stage 3). Digital imaging methods were used to measure marginal gap. The results indicate decreasing trend of margin gap as a function of margin design in the order A>B>C>D. Between processing steps, the trend was in the order Stage 3 < Stage 1 < Stage 2. Porcelain firing had no significant effect on marginal adaptation, but cementation decreased the marginal gap. Generally, the margin gap in Captek restorations were in all cases less than the reported acceptable range of margin gaps for ceramometal restorations. These results are clinically favorable outcomes and may be associated with the ductility and burnishability of matrix phase in Captek metal coping margins.
机译:这项研究检查了四种边缘设计对Captek冠在选择的加工步骤中的边缘适应性的影响。制作了二十四枚Captek表冠,四个边缘设计各六枚:肩部(A组),倒角(B组),带斜角的倒角(C组)和带斜角的肩部(D组)。在应用瓷器(步骤2)和固结剂(步骤3)之后,在应对阶段(步骤1)在每个样品的选定点测量冠和匹配模具之间的边际差异。使用数字成像方法来测量边缘间隙。结果表明,随着A> B> C> D的顺序,边距的减小趋势随边距设计的变化而变化。在加工步骤之间,趋势按阶段3 <阶段1 <阶段2的顺序排列。烧瓷对边际适应性没有显着影响,但胶结减少了边际间隙。通常,在所有情况下,Captek修复体的边缘间隙都小于陶瓷金属修复体所报告的可接受的边缘间隙范围。这些结果在临床上是有利的结果,并且可能与Captek金属顶盖边缘中基体相的延展性和抛光性有关。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号