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Reduction of Oxygen Impurity in Multicrystalline Silicon Production

机译:减少多晶硅生产中的氧杂质

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Effective control of oxygen impurity in multicrystalline silicon is required for the production of a high-quality crystal. The basic principle and some techniques for reducing oxygen impurity in multicrystalline silicon during the unidirectional solidification process are described in this paper. The oxygen impurity in multicrystalline silicon mainly originates from the silica crucible. To effectively reduce the oxygen impurity, it is essential to reduce the oxygen generation and enhance oxygen evaporation. For reduction of oxygen generation, it is necessary to prevent or weaken any chemical reaction with the crucible, and for the enhancement of oxygen evaporation, it is necessary to control convection direction of the melt and strengthen gas flow above the melt. Global numerical simulation, which includes heat transfer in global furnace, argon gas convection inside furnace, and impurity transport in both melt and gas regions, has been implemented to validate the above methods.
机译:为了生产高质量的晶体,需要有效控制多晶硅中的氧杂质。本文介绍了单向凝固过程中减少多晶硅中氧杂质的基本原理和一些技术。多晶硅中的氧杂质主要来自二氧化硅坩埚。为了有效地减少氧杂质,必须减少氧的产生并增强氧的蒸发。为了减少氧气的产生,有必要防止或减弱与坩埚的任何化学反应,并且为了增强氧气的蒸发,必须控制熔体的对流方向并增强熔体上方的气流。为了验证上述方法,已进行了整体数值模拟,其中包括整体炉中的传热,炉内氩气对流以及熔体和气体区域中的杂质传输。

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