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Involvement of autophagy in tantalum nanoparticle-induced osteoblast proliferation

机译:自噬参与钽纳米颗粒诱导的成骨细胞增殖

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Porous tantalum (Ta) implants are highly corrosion resistant and biocompatible, and they possess significantly better initial stability than that of conventional titanium (Ti) implants. During loading wear, Ta nanoparticles (Ta-NPs) that were deposited on the surface of a porous Ta implant are inevitably released and come into direct contact with peri-implant osteoblasts. The wear debris may influence cell behavior and implant stabilization. However, the interaction of Ta-NPs with osteoblasts has not been clearly investigated. This study aimed to investigate the effect of Ta-NPs on cell proliferation and their underlying mechanism. The Cell Counting Kit-8 (CCK-8) assay was used to measure the cell viability of MC3T3-E1 mouse osteoblasts and showed that Ta-NP treatment could increase cell viability. Then, confocal microscopy, Western blotting, and transmission electron microscopy were used to confirm the autophagy induced by Ta-NPs, and evidence of autophagy induction was observed as positive LC3 puncta, high-LC3-II expression, and autophagic vesicle ultrastructures. The CCK-8 assay revealed that the cell viability was further increased and decreased by the application of an autophagy inducer and inhibitor, respectively. In addition, pre-treatment with autophagy inhibitor 3-methyladenine (3-MA) inhibited the Ta-NP-induced autophagy. These results indicate that the Ta-NPs can promote cell proliferation, that an autophagy inducer can further strengthen this effect and that an autophagy inhibitor can weaken this effect. In conclusion, autophagy was involved in Ta-NP-induced cell proliferation and had a promoting effect.
机译:多孔钽(Ta)植入物具有高度的耐蚀性和生物相容性,并且与常规的钛(Ti)植入物相比,具有更高的初始稳定性。在加载磨损过​​程中,不可避免地会释放沉积在多孔Ta植入物表面的Ta纳米颗粒(Ta-NPs),并与植入物周围的成骨细胞直接接触。磨损碎片可能会影响细胞行为和植入物稳定性。但是,尚未明确研究Ta-NP与成骨细胞的相互作用。这项研究旨在调查Ta-NPs对细胞增殖的影响及其潜在机制。细胞计数试剂盒8(CCK-8)分析用于测量MC3T3-E1小鼠成骨细胞的细胞活力,并显示Ta-NP处理可以增加细胞活力。然后,共聚焦显微镜,Western印迹和透射电镜被用来确认Ta-NPs诱导的自噬,并观察到自噬诱导的证据是阳性的LC3点状,高LC3-II表达和自噬小泡超微结构。 CCK-8测定表明,分别应用自噬诱导剂和抑制剂可进一步提高和降低细胞活力。此外,用自噬抑制剂3-甲基腺嘌呤(3-MA)进行预处理可抑制Ta-NP诱导的自噬。这些结果表明,Ta-NP可以促进细胞增殖,自噬诱导剂可以进一步增强该作用,并且自噬抑制剂可以减弱该作用。总之,自噬参与Ta-NP诱导的细胞增殖并具有促进作用。

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