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首页> 外文期刊>International Journal of Energy Engineering >Structural and Optical Characterization of Nitrogen-doped TiO2 Thin Films Deposited by Spray Pyrolysis on Fluorine Doped Tin Oxide (FTO) Coated Glass Slides
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Structural and Optical Characterization of Nitrogen-doped TiO2 Thin Films Deposited by Spray Pyrolysis on Fluorine Doped Tin Oxide (FTO) Coated Glass Slides

机译:掺氟氧化锡(FTO)涂层载玻片上喷雾热解沉积氮掺杂TiO 2 薄膜的结构和光学特性

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Undoped and nitrogen-doped titanium dioxide (TiO2) thin films of 400 nm thick deposited by spray pyrolysis were structurally and optically characterized. The effect of substrate temperature on the optical properties of the films was also investigated. Structural studies of the films were undertaken by X-ray diffraction (XRD). Energy dispersive X-ray (EDX) spectrum analysis was used to confirm the presence of nitrogen atoms in the film after doping. The optical properties such as refractive index (n), energy band gap (Eg) and Urbach energy (Eu) were determined from spectrophotometric measurements of reflectance and transmittance for both undoped and doped films. The Undoped films had an energy band gap of 3.25 eV while the doped films had band gap of 2.90 eV. The Urbach energy increased from 1.00 eV for undoped films to 1.04 eV for the nitrogen-doped films. The reduction in energy band gap and increase in Urbach energy was attributed to the introduction of nitrogen impurity tail states on either the conduction band or the valence band of the titanium dioxide.
机译:通过喷雾热解沉积了厚度为400nm的未掺杂和氮掺杂的二氧化钛(TiO 2)薄膜。还研究了基材温度对薄膜光学性能的影响。薄膜的结构研究是通过X射线衍射(XRD)进行的。能量色散X射线(EDX)光谱分析用于确认掺杂后膜中氮原子的存在。光学性质,例如折射率(n),能带隙(Eg)和乌尔巴赫能(Eu),是通过分光光度法测量未掺杂和掺杂膜的反射率和透射率来确定的。未掺杂的膜的能带隙为3.25eV,而掺杂的膜的能带隙为2.90eV。 Urbach能量从无掺杂薄膜的1.00 eV增加到氮掺杂薄膜的1.04 eV。能带隙的减少和Urbach能量的增加归因于在二氧化钛的导带或价带上引入了氮杂质尾态。

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