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Stranski-Krastanov Mode in Iron Electrodeposition

机译:侧面克拉斯坦诺夫模式和铁电沉积

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The morphological transition of iron thin films generated by a rectangular pulse current technique having a frequency ranging from 0.1 to 1 MHz was investigated using scanning electron microscope (SEM) and X-ray diffraction (XRD). An increase in the film thickness of the iron thin film grown on an ITO glass was found to cause two types of the Stranski-Krastanov (S-K) mode: the forward S-K mode that the two-dimensional growth changes into the three dimensional growth first appeared, and the reverse S-K mode that the three dimensional growth changes into the two-dimensional growth secondly appeared. A critical film thickness at which the S-K mode transition occurs was several orders of magnitude larger than that reported in vapor phase epitaxy. In addition, an increase in the deposition temperature also caused the reverse S-K mode. XRD analysis revealed that the S-K mode took place owing to the competition between the dominant (211) plane and the (110) plane. The iron thin film composed of only the (211) plane parallel to the ITO glass was generated.
机译:使用扫描电子显微镜(SEM)和X射线衍射(XRD)研究了矩形脉冲电流技术产生的铁薄膜的形态学转变,该技术的频率范围为0.1到1 MHz。发现在ITO玻璃上生长的铁薄膜的膜厚度增加会导致两种类型的Stranski-Krastanov(SK)模式:正向SK模式,即二维增长转变为三维增长,然后出现了从三维生长转变为二维生长的反向SK模式。发生S-K模式转变的临界膜厚度比气相外延中报道的临界膜厚度大几个数量级。另外,沉积温度的升高也引起了反向S-K模式。 XRD分析表明,S-K模式是由于优势(211)平面和(110)平面之间的竞争而发生的。产生仅由与ITO玻璃平行的(211)面构成的铁薄膜。

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