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首页> 外文期刊>Indian journal of engineering and materials sciences >Taguchi and multi-objective genetic algorithm-based optimization during ECDM of SiCp/glass fibers reinforced PMCs
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Taguchi and multi-objective genetic algorithm-based optimization during ECDM of SiCp/glass fibers reinforced PMCs

机译:基于Taguchi和基于多目标遗传算法的SiCp /玻璃纤维增​​强PMC ECDM优化

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The acceptance of electrically nonconductive fibrous materials has been increased over the past decade in industrial applications due to their better strength to weight ratio and electrically nonconductive nature. But precise machining of these types of materials has always been a challenging task for the research fraternity. The precise machining of these materials refers to reduced overcut along with significant material removal rate (MRR). In such perspective, multi-objective genetic algorithm (MOGA) evident to be suitable optimization technique for prediction and process selection in manufacturing industries. The present paper deals with multi-objective optimization of electrochemical discharge machining (ECDM) process parameters during machining of SiCsubp /suband glass fibers reinforced polymer matrix composites (PMCs) using MOGA. The experiments have been designed as per Taguchi’s design of experiments using Lsub16/sub orthogonal array. Electrolyte concentration, inter-electrode gap, duty factor, and voltage have been used as process parameters whereas MRR and overcut have been observed as output quality characteristics (OQCs). The obtained experimental results have been optimized by multi-response optimization technique MOGA to attain high MRR with minimum possible overcut. The quality of machined holes has been analyzed using scanning electron microscope (SEM). The analysis reveals that result optimized through MOGA produces enhanced output quality characteristics.
机译:在过去的十年中,由于它们具有更好的强度重量比和非导电性,在工业应用中对非导电纤维材料的接受度有所提高。但是,对这类材料进行精确加工一直是研究界的一项艰巨任务。这些材料的精确加工意味着减少了过切,同时具有显着的材料去除率(MRR)。从这种角度来看,多目标遗传算法(MOGA)显然是制造业预测和工艺选择的合适优化技术。本文研究了使用MOGA对SiC p 和玻璃纤维增​​强的聚合物基复合材料(PMC)进行加工时电化学放电加工(ECDM)工艺参数的多目标优化。这些实验是根据Taguchi使用L 16 正交阵列进行的实验设计而设计的。电解质浓度,电极间间隙,占空比和电压已被用作工艺参数,而MRR和过切被视为输出质量特征(OQC)。通过多响应优化技术MOGA对获得的实验结果进行了优化,以实现较高的MRR,同时将可能的透支降至最低。加工孔的质量已使用扫描电子显微镜(SEM)进行了分析。分析表明,通过MOGA优化的结果可产生增强的输出质量特性。

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