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Effects of Helium Addition to Radio-Frequency Argon Glow-Discharge Mass Spectrometry

机译:氦气对射频氩辉光放电质谱法的影响

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The addition of helium to argon up to 5% significantly decreased the sputtering rate for a brass sample, while about 30% increases of copper and zinc-ion signals were observed upon the 2% helium addition. The normalized ionization efficiencies were calculated from the ratio of the ion intensity and the atom density in the plasma measured by atomic absorption spectrometry. The ionization efficiency at 4% addition of helium was 25-times higher than that for pure argon. No change in the DC self-bias voltage was observed for various additions of helium. These characteristics were compared with the oxygen addition as well as with a DC glow discharge. The differences in the ion-signal behavior between the radio frequency and DC glow discharges are discussed.
机译:将氦气添加到氩气中至多5%会大大降低黄铜样品的溅射速率,而在添加2%的氦气时,铜和锌离子信号会增加大约30%。由通过原子吸收光谱法测量的等离子体中的离子强度与原子密度之比计算归一化的电离效率。加入4%的氦气时的电离效率比纯氩气高25倍。对于各种添加的氦气,未观察到直流自偏压的变化。将这些特性与氧气添加量以及直流辉光放电进行了比较。讨论了射频和直流辉光放电之间离子信号行为的差异。

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