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首页> 外文期刊>Analytical Sciences >Effect of Ligands on the Iron(III)/Iron(II) System and Its Novel Application to the Simultaneous Flow Injection Determination of Vanadium(IV) and Vanadium(V)
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Effect of Ligands on the Iron(III)/Iron(II) System and Its Novel Application to the Simultaneous Flow Injection Determination of Vanadium(IV) and Vanadium(V)

机译:配体对铁(III)/铁(II)体系的影响及其在流动注射同时测定钒(IV)和钒(V)中的新应用

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摘要

A new simultaneous flow injection determination of vanadium(IV) and vanadium(V) has been proposed with photometric detection. The method is based on the effect of ligands on the formal redox potential of the iron(III)/iron(II) system. The potential of the redox system increases due to the presence of 1, 10-phenanthroline (phen); vanadium(IV) is thus easily oxidized by iron(III) to vanadium(V), producing an Iron(II)-phen complex (λmax=510nm). On the other hand, the presence of diphosphate causes an increase in the reducing power of iron(II) because of a decrease in the potential of the system. Thus, the reduction of vanadium(V) by iron(II) takes place easily. By using an FIA system and measuring the absorbance of the complex at 510nm, the simultaneous determination of vanadium(IV) and vanadium(V) is possible based on both reactions. The proposed method makes it possible to obtain both positive and negative FIA peaks corresponding to the concentrations of vanadium(IV) and vanadium(V) alternatively by a single injection of the sample solution. Vanadium(IV) and vanadium(V) at the 10-6mol dm-3 level can be determined at a rate of 30 samples h-1(60 peaks h-1).
机译:提出了一种通过光度检测同时测定钒和钒的新方法。该方法基于配体对铁(III)/铁(II)体系的形式氧化还原电势的影响。由于存在1、10-菲咯啉(phen),氧化还原系统的电势增加。因此,钒(IV)容易被铁(III)氧化为钒(V),从而生成铁(II)-苯配合物(λmax= 510nm)。另一方面,由于体系电位的降低,二磷酸盐的存在导致铁(II)的还原能力增加。因此,铁(II)容易还原钒(V)。通过使用FIA系统并测量络合物在510nm处的吸光度,可以基于两个反应同时测定钒(IV)和钒(V)。所提出的方法使得可以通过单次注入样品溶液来获得对应于钒(IV)和钒(V)浓度的正和负FIA峰。可以以30个样品h-1(60个峰h-1)的速率测定10-6mol dm-3含量的钒(IV)和钒(V)。

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