...
首页> 外文期刊>AIP Advances >Effects of background gas on sulfur hexafluoride removal by atmospheric dielectric barrier discharge plasma
【24h】

Effects of background gas on sulfur hexafluoride removal by atmospheric dielectric barrier discharge plasma

机译:背景气体对大气介质阻挡放电等离子体去除六氟化硫的影响

获取原文
   

获取外文期刊封面封底 >>

       

摘要

The effects of background gases (He, Ar, N2 and air) on SF6 removal in a dielectric barrier reactor were investigated at atmospheric pressure. A comparison among these background gases was performed in terms of discharge voltage, discharge power, mean electron energy, electron density, removal efficiency and energy yield for the destruction of SF6. Results showed that the discharge voltage of He and Ar was lower than that of N2 and air, but the difference of their discharge power was small. Compared with three other background gases, Ar had a relatively superior destruction and removal rate and energy yield since the mean electron energy and electron density in SF6/H2O/Ar plasma were both maintained at a high level. Complete removal of 2% SF6 could be achieved at a discharge power of 48.86 W with Ar and the corresponding energy yield can reach 4.8 g/kWh.
机译:在大气压下研究了背景气体(He,Ar,N 2 和空气)对介质阻挡反应器中SF 6 去除的影响。在放电电压,放电功率,平均电子能量,电子密度,去除效率和破坏SF 6 的能量产率方面对这些背景气体进行了比较。结果表明,He和Ar的放电电压低于N 2 和空气的放电电压,但两者的放电功率差异较小。与其他三种背景气体相比,由于SF 6 / H 2 O / Ar中的平均电子能和电子密度,Ar具有相对更好的破坏和去除速率以及能量产率。血浆均维持在较高水平。在具有Ar的48.86 W的放电功率下,可以完全去除2%SF 6 ,相应的能量产量可以达到4.8 g / kWh。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号