Real-Time Fab-Wise Airborne Molecular Contaminant (AMC) Monitoring System Using Multiple Fourier Transform Infrared (FTIR) Spectrometers in a Semiconductor Plant

摘要

The objective of this study was to investigate the airborne pollutant emission sources and fluctuations around the indoor and outdoor environments of a semiconductor manufacturing plant using monitoring data that were collected over 4 consecutive days via three Fourier transform infrared (FTIR) spectrometers located near an outdoor make-up air unit and an indoor Fab and sub Fab. Based on a total of 1,032 five-minute-interval records, fourteen chemicals were detected. Six of these chemicals, namely, carbon tetrafluoride, nitrous oxide, carbon monoxide, silane, sulfur hexafluoride, and methane, had significant concentration correlations between the indoor and outdoor environments. With the exception of silane and sulfur hexafluoride, the percentage of indoor/outdoor concentration ratios that were greater than one ranged from 62.2% to 73.1%, indicating that the indoor chemical concentrations were typically higher than the outdoor concentrations.