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首页> 外文期刊>ACS Omega >Patterning Metal Nanowire-Based Transparent Electrodes by Seed Particle Printing
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Patterning Metal Nanowire-Based Transparent Electrodes by Seed Particle Printing

机译:通过种子粒子印刷图案化基于金属纳米线的透明电极

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摘要

This article describes a unique combination of inkjet printing of functional materials with an intricate self-assembly process. Gold–silver nanowire (NW) mesh films were produced by a sequential deposition process, in which small metal seed nanoparticle film was deposited at desired areas by inkjet printing, followed by coating with a thin film of NW growth solution. Two different types of NW growth solutions were used: the first, based on benzylhexadecyldimethylammonium chloride, exhibited a bulk solution growth mode and was thus suitable for coverage of large uniform areas. The second type was based on hexadecyltrimethylammonium bromide, which induced NW growth confined to the substrate–solution interface and thus enabled patterning of small transparent electrode features, which have the same dimensions as the deposited seed droplets. A selective silver plating bath was used to thicken the ultrathin NWs, stabilize them, and reduce the sheet resistance, resulting in films with sheet resistance in the range of 20–300 Ω/sq, 86–95% light transmission, and a relatively low haze. This simple patterning method of the NW film works at ambient conditions on many different types of substrates and has the potential to replace the conventional photolithography used for indium tin oxide patterning for applications such as touch sensors and flexible/stretchable electronics.
机译:本文介绍了功能材料的喷墨打印与复杂的自组装过程的独特组合。金银纳米线(NW)网格膜是通过顺序沉积工艺生产的,其中通过喷墨印刷在所需区域沉积小金属种子纳米颗粒膜,然后涂覆NW生长溶液薄膜。使用了两种不同类型的NW生长溶液:第一种基于氯化苄基十六烷基二甲基铵,表现出整体溶液生长模式,因此适合覆盖大面积均匀区域。第二种类型是基于十六烷基三甲基溴化铵,它可以将NW的生长限制在底物与溶液的界面,从而可以图案化小的透明电极特征,其尺寸与沉积的种子液滴相同。使用选择性镀银浴来增厚超薄NW,使其稳定并降低薄层电阻,从而导致薄膜的薄层电阻范围为20-300Ω/ sq,透光率86-95%,并且相对较低阴霾。 NW膜的这种简单的构图方法可在环境条件下在许多不同类型的基板上工作,并且有可能取代用于铟锡氧化物构图的常规光刻技术,例如触摸传感器和柔性/可拉伸电子设备。

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