Basaltic stones with epilithic lichens as a novel substrate for an osmotolerant fungus, Aspergillus glaucus

摘要

Aspergillus glaucus is a fungus able to tolerate low water activity of the environment. Its dense growth and sporulation were found on basaltic stones with epilithic lichens after 14 years of storage at a temperature of 4–7°C and relative humidity of 14–18%. Dust and soil particles deposited on the lichen thalli and dissolved in the water condensed on the stones during the storage period, apparently served as a nutrient source for the fungus. Probably, strongly xeric water regime on basaltic stones suitable for A. glaucus did not allow mesophilic fungi to develop and prevented the xerotolerant fungus from competition with other microfungi for nutrient sources. It is also possible that specific cellular mechanism associated with the production of chaotropic compounds (such as glycerol) supported germination and development of A. glaucus at low temperatures, which were considered non-optimal for the fungus.