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Hydrogen Permeation, and Mechanical and Tribological Behavior, of CrNx Coatings Deposited at Various Bias Voltages on IN718 by Direct Current Reactive Sputtering

机译:直流反应溅射在IN718上以各种偏置电压沉积的CrNx涂层的氢渗透性以及力学和摩擦学行为

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In the current work, the microstructure, hydrogen permeability, and properties of chromium nitride (CrNx) thin films deposited on the Inconel 718 superalloy using direct current reactive sputtering are investigated. The influence of the substrate bias voltage on the crystal structure, mechanical, and tribological properties before and after hydrogen exposure was studied. It was found that increasing the substrate bias voltage leads to densification of the coating. X-ray diffraction (XRD) results reveal a change from mixed fcc-CrN + hcp-Cr2N to the approximately stoichiometric hcp-Cr2N phase with increasing substrate bias confirmed by wavelength-dispersive X-ray spectroscopy (WDS). The texture coefficients of (113), (110), and (111) planes vary significantly with increasing substrate bias voltage. The hydrogen permeability was measured by gas-phase hydrogenation. The CrN coating deposited at 60 V with mixed c-CrN and (113) textured hcp-Cr2N phases exhibits the lowest hydrogen absorption at 873 K. It is suggested that the crystal orientation is only one parameter influencing the permeation resistance of the CrNx coating together with the film structure, the presence of mixing phases, and the packing density of the structure. After hydrogenation, the hardness increased for all coatings, which could be related to the formation of a Cr2O3 oxide film on the surface, as well as the defect formation after hydrogen loading. Tribological tests reveal that hydrogenation leads to a decrease of the friction coefficient by up to 40%. The lowest value of 0.25 ± 0.02 was reached for the CrNx coating deposited at 60 V after hydrogenation.
机译:在当前工作中,研究了使用直流电反应溅射沉积在Inconel 718高温合金上的氮化铬(CrNx)薄膜的微观结构,氢渗透性和性能。研究了衬底偏压对氢暴露前后晶体结构,机械性能和摩擦学性能的影响。发现增加衬底偏置电压导致涂层致密化。 X射线衍射(XRD)结果表明,从混合的fcc-CrN + hcp-Cr2N相到近似化学计量的hcp-Cr2N相,随波长色散X射线光谱法(WDS)的增加,衬底的偏压也随之增加。 (113),(110)和(111)平面的织构系数随衬底偏置电压的增加而显着变化。氢渗透率通过气相氢化来测定。在60 V下沉积具有混合c-CrN和(113)织构hcp-Cr2N相的CrN涂层在873 K处表现出最低的氢吸收率。这表明晶体取向仅是一个共同影响CrNx涂层耐渗透性的参数。膜结构,混合相的存在以及结构的堆积密度。氢化后,所有涂层的硬度均增加,这可能与表面上形成Cr2O3氧化物膜以及加氢后形成缺陷有关。摩擦学测试表明,加氢会导致摩擦系数降低多达40%。氢化后在60 V下沉积的CrNx涂层的最低值达到0.25±0.02。

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