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Optimization of wavefront-coded infinity-corrected microscope systems with extended depth of field

机译:扩展景深的波前编码无穷大校正显微镜系统的优化

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The depth of field of an infinity-corrected microscope system is greatly extended by simply applying a specially designed phase mask between the objective and the tube lens. In comparison with the method of modifying the structure of objective, it is more cost effective and provides improved flexibility for assembling the system. Instead of using an ideal optical system for simulation which was the focus of the previous research, a practical wavefront-coded infinity-corrected microscope system is designed in this paper by considering the various aberrations. Two new optimization methods, based on the commercial optical design software, are proposed to design a wavefront-coded microscope using a non-symmetric phase mask and a symmetric phase mask, respectively. We use polynomial phase mask and rational phase mask as examples of the non-symmetric and symmetric phase masks respectively. Simulation results show that both optimization methods work well for a 32 × infinity-corrected microscope system with 0.6 numerical aperture. The depth of field is extended to about 13 times of the traditional one.
机译:只需在物镜和套筒透镜之间简单应用特殊设计的相位掩模,就可以大大扩展无限远校正显微镜系统的景深。与修改物镜结构的方法相比,它更具成本效益,并为组装系统提供了更高的灵活性。本文没有考虑先前研究的重点,而是使用理想的光学系统进行仿真,而是通过考虑各种像差,设计了一种实用的波前编码无穷大校正显微镜系统。提出了两种基于商用光学设计软件的优化方法,分别使用非对称相位掩模和对称相位掩模设计波前编码显微镜。我们分别使用多项式相位掩码和有理相位掩码作为非对称和对称相位掩码的示例。仿真结果表明,这两种优化方法均适用于数值孔径为0.6的32×无限远校正显微镜系统。景深扩展到传统的13倍左右。

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