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Effect of cyclic loading under enzymatic activity on resin-dentin interfaces of two self-etching adhesives

机译:酶活性下循环载荷对两种自蚀胶黏剂树脂-牙本质界面的影响

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Objectives. To evaluate microtensile bond strength and micro-morphology at the resin-dentin interfaces of two self-etching adhesive systems subjected to simultaneous mechanical and enzymatic stress. Methods. Sixteen enamel/dentin discs were bonded with a two-step self-etching adhesive (AdheSE, n = 8) and a one-step self-etching adhesive (Xeno III, n = 8) to a 2 mm thick resin composite layer. One resin-dentin bar was obtained per tooth. In half of the specimens of each group ijlTBS and micro-morphological evaluations (TEM) was performed without loading. The other half was mechanically loaded in a cholinesterase-containing solution. μTBS as well as ultra-morphological evaluations of the directly loaded areas using TEM were performed on the loaded specimens. Results. The μTBS of the specimens (non-loaded/loaded) were of 39.6 ± 14.7/35.4 ± 22.1 and of 21.8 ± 29.8/15.9 ± 25.5 for AdheSE and Xeno III, respectively. Under TEM, both materials presented signs of nanoleakage. However, on loaded specimens the extent of nanoleakage was slightly reduced for AdheSE and no silver staining was observed on the adhesive interface of Xeno III. TEM evaluations of the specimens' loaded area revealed no decrease in the width of the adhesive interface for AdheSE. The contrary was observed in the interface created by Xeno III. Significance. The adhesive interfaces created by the two-step self-etching adhesive (AdheSE) could better withstand both mechanical and enzymatic stresses on the long-term than the one-step self-etching system (Xeno III) tested in the present study.
机译:目标。为了评估在同时受到机械和酶促应力作用的两个自蚀刻胶粘剂系统的树脂-牙本质界面处的微拉伸粘合强度和微观形态。方法。用两步自蚀刻粘合剂(AdheSE,n = 8)和一步自蚀刻粘合剂(Xeno III,n = 8)将16个搪瓷/牙本质盘粘合到2毫米厚的树脂复合层上。每个牙齿获得一根树脂-牙本质棒。在每组ijlTBS的一半标本中进行无负荷微形态评估(TEM)。将另一半机械地装载在含胆碱酯酶的溶液中。在加载的样本上进行了μTBS以及使用TEM对直接加载区域的超形态学评估。结果。对于AdheSE和Xeno III,标本(未加载/加载)的μTBS分别为39.6±14.7 / 35.4±22.1和21.8±29.8 / 15.9±25.5。在TEM下,两种材料都呈现出纳米泄漏的迹象。但是,在加载的样品上,AdheSE的纳米渗漏程度有所降低,并且在Xeno III的粘合界面上未观察到银染。 TEM对标本加载区域的评估表明AdheSE的粘合剂界面宽度没有减小。在Xeno III创建的界面中观察到相反的情况。意义。与本研究中测试的单步自蚀刻系统(Xeno III)相比,两步自蚀刻粘合剂(AdheSE)产生的粘合剂界面可以长期更好地承受机械应力和酶应力。

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