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Full-contour Y-TZP ceramic surface roughness effect on synthetic hydroxyapatite wear

机译:Y-TZP全轮廓陶瓷表面粗糙度对合成羟基磷灰石磨损的影响

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摘要

Objective. To investigate the effects of polishing techniques on the surface roughness of Y-TZP ceramic and on the wear behavior of synthetic hydroxyapatite (HA). Methods. Thirty-two full-contour Y-TZP (Diazir~®) sliders (φ = 2 mm × 1.5 mm in height) were manufactured using CAD/CAM, embedded in acrylic resin using brass holders, and randomly allocated into four groups (n = 8): according to the finishing/polishing procedure: Gl-as-machined, G2-glazed, G3-diamond bur finishing and G4 - G3 + OptraFine~® polishing kit. Thirty-two sintered HA disks (φ = 13 mm × 2.9 mm in height) were similarly mounted in brass holders. Y-TZP sliders baseline surface roughness values (Ra and Rq, in μm) were recorded using a non-contact profilometer (ProScan 2000). A two-body pin-on-disc wear test was performed. HA height (μm) and volume (mm~3) losses were measured. Y-TZP height loss was measured using a digital micrometer. One-way ANOVA was used to determine the effect of the polishing techniques on the surface roughness. Comparisons between groups for differences in antagonist height loss/volume, and slider height loss were performed using one-way ANOVA. Statistical significance was set at α = 0.05. Results. Roughness measurements showed significant differences (p = 0.0001) among the surface treatments with G1 (Ra = 0.84, Rq = 1.13 μm) and G3 (Ra = 0.89, Rq = 1.2 (μm) being the roughest, and G2 (Ra = 0.42, Rq = 0.63 μm) the smoothest (p = 0.0001). Y-TZP slider height loss was highest for the glazed group (35.39 μm), and was lowest for the polished group (6.61 μm) (p = 0.0001). Antagonist volume and height losses for groups (G1-G3) were similar, while the polished group (1.3 mm~3, 14.7 μm) showed significant lower values (p = 0.0001). Significance. Although glazed zirconia provides an initially smooth surface, significantly increased antagonist wear was observed compared to the polished Y-TZP zirconia surface.
机译:目的。研究抛光技术对Y-TZP陶瓷表面粗糙度和合成羟基磷灰石(HA)磨损行为的影响。方法。使用CAD / CAM制造了32个全轮廓Y-TZP(Diazir®)滑块(φ= 2 mm×1.5 mm高),并使用黄铜支架嵌入丙烯酸树脂中,并随机分为四组(n = 8):根据精加工/抛光程序:机加工的GL,G2上釉的,G3-金刚石bur精加工和G4-G3 + OptraFine〜®抛光套件。将三十二个烧结HA盘(φ= 13 mm×2.9 mm高)类似地安装在黄铜支架中。使用非接触轮廓仪(ProScan 2000)记录Y-TZP滑块的基线表面粗糙度值(Ra和Rq,以μm为单位)。进行了两盘式针盘磨损试验。测量HA的高度(μm)和体积(mm〜3)损失。使用数字千分尺测量Y-TZP高度损失。单向方差分析用于确定抛光技术对表面粗糙度的影响。使用单向方差分析进行两组之间拮抗剂高度损失/体积和滑块高度损失差异的比较。统计显着性设定为α= 0.05。结果。粗糙度测量结果显示,在表面处理中,G1(Ra = 0.84,Rq = 1.13μm)和G3(Ra = 0.89,Rq = 1.2(μm)是最粗糙的,而G2(Ra = 0.42, Rq = 0.63μm)最光滑(p = 0.0001)。Y-TZP滑块高度损失在上釉组中最高(35.39μm),在抛光组中最低(6.61μm)(p = 0.0001)。组(G1-G3)的高度损失相似,而抛光组(1.3 mm〜3,14.7μm)显示出较低的值(p = 0.0001)。意义。尽管釉面氧化锆最初提供了光滑的表面,但拮抗剂的磨损显着增加与抛光的Y-TZP氧化锆表面相比,观察到的结果。

著录项

  • 来源
    《Dental materials》 |2013年第6期|666-673|共8页
  • 作者单位

    Department of Restorative Dentistry (Graduate Operative), Indiana University School of Dentistry (IUSD), Indianapolis, IN, USA;

    Department of Restorative Dentistry (Graduate Operative), Indiana University School of Dentistry (IUSD), Indianapolis, IN, USA;

    Department of Restorative Dentistry (Graduate Operative), Indiana University School of Dentistry (IUSD), Indianapolis, IN, USA;

    Department of Preventive and Community Dentistry, IUSD, Indianapolis, IN, USA;

    Department of Restorative Dentistry, Division of Dental Biomaterials, IUSD, Indianapolis, IN, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Zirconia; Y-TZP; Two-body wear; Glaze; Roughness; Hydroxyapatite;

    机译:氧化锆Y-TZP;两体磨损;釉;粗糙度羟基磷灰石;
  • 入库时间 2022-08-18 03:47:03

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