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Corrosion behavior of ion-irradiated SiC in FLiNaK molten salt

机译:离子辐照SiC在FLiNaK熔盐中的腐蚀行为

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摘要

High-purity 4H-SiC samples exposed to 1-MeV Si ions irradiation at RT were corroded in FLiNaK molten salt at 650 degrees C for 168 h. Results revealed the corrosion degree of irradiated SiC was dependent on the irradiation fluence. The amorphous region induced by irradiation was preferentially corroded, where Si elements could dissolve into the salt more easily than those in the unirradiated region. The dissolution of Si elements caused the formation of sustained nanocracks and nanopores, and thus the corrosion layer having a thickness of 200 +/- 50 nm fell off. Moreover, oxygen impurities might play a role in the irradiation-assisted corrosion.
机译:在室温下暴露于1-MeV Si离子的高纯度4H-SiC样品在650℃的FLiNaK熔融盐中腐蚀168小时。结果表明,辐照SiC的腐蚀程度取决于辐照通量。辐照引起的非晶区被优先腐蚀,与未辐照区相比,硅元素更容易溶解到盐中。 Si元素的溶解引起持续的纳米裂纹和纳米孔的形成,因此厚度为200 +/- 50nm的腐蚀层脱落。此外,氧杂质可能在辐射辅助腐蚀中起作用。

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