Semi equipment manufacturer streamlines cleanroom production

摘要

Higher cleanroom standards and more space for development of its LMS IPRO3 mask metrology technology have prompted Leica Microsystems (www.leica-microsystems.com) to replace its existing cleanroom with a nearly 2,000-square-foot facility that will be used for system assembly and integration as well as for customer acceptance tests. Leica Microsystems, recently acquired by Illinois-based Danaher Corp. (see related story, page 6), specializes in high-precision optical instrumentation used in microscopy, imaging systems, specimen preparation, medical equipment, and semiconductor manufacturing equipment. Its automated LMS IPRO3 technology is designed to support mask metrology requirements for 65 nm processes, and has been acclaimed for its measurement performance and reliability.