New way of measuring particles in water for semicon production

摘要

W L Gore & Associates and CT Associates have developed a new method for measuring sub-50nm particles in ultra-pure water (UPW) used in semiconductor processing. It can also remove particles as small as 12nm through a combination of ultraflltration and microfiltration. Semiconductor manufacturers need to know that their UPW systems can produce water that is free of small particles that could otherwise cause yield issues.