B_4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm

摘要

The B_4C/Mo/Si high reflectivity multilayer mirror was designed for He-Ⅱ radiation (30.4 nm) using the layer- by- layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5°. The B_4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B_4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B_4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.