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首页> 外文期刊>Chemosphere >Degradation of EDTA in H_2O_2 -containing wastewater by photo-electrochemical peroxidation
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Degradation of EDTA in H_2O_2 -containing wastewater by photo-electrochemical peroxidation

机译:光电化学过氧化降解含H_2O_2废水中的EDTA。

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摘要

Semiconductor wastewater currently contains H2O2which is an important reagent in wafers cleaning. Recalcitrant organic pollutant such as EDTA are always present in this type of wastewater and may represent a threat for the environment. In this work, a new photoelectrochemical reactor is proposed to remove EDTA from H2O2contaning wastewater. First, photolysis, electrochemical peroxidation and photo-electrochemical peroxidation were compared. The results showed that the removal efficiency decreases in the sequence: UV/H2O2«EC/H2O22O2. The main parameters affecting the photo-electrochemical peroxidation process were studied. The study revealed that the optimal current was 50 mA, while the optimum initial pH was found in the acidic range from 2.25 to 3.0, with a peak at 2.25. Increasing H2O2concentration results in increasing in EDTA removal up to 92.1%, while decreasing initial EDTA concentration up to 22.5 mg L−1gives a complete removal in only 90 min. It was also found that the degradation of EDTA greatly depends on the nature of the present cation.
机译:半导体废水目前含有H2O2,H2O2是晶圆清洗中的重要试剂。这类废水中总是存在顽强的有机污染物,例如EDTA,可能对环境构成威胁。在这项工作中,提出了一种新型的光电化学反应器,用于从含H2O2的废水中去除EDTA。首先,比较了光解,电化学过氧化和光电化学过氧化。结果表明,去除效率依次降低:UV / H2O2«EC / H2O22O2。研究了影响光电化学过氧化过程的主要参数。研究表明,最佳电流为50 mA,而最佳初始pH在2.25至3.0的酸性范围内,其峰值为2.25。增加H2O2的浓度可将EDTA的去除率提高至92.1%,而将初始EDTA的浓度降低至22.5μg/ L-1则仅在90μmin内即可完全去除。还发现EDTA的降解在很大程度上取决于本阳离子的性质。

著录项

  • 来源
    《Chemosphere 》 |2018年第10期| 984-990| 共7页
  • 作者单位

    Laboratoire de Génie Chimique, Département de Chimie Industrielle, Université Saad Dahlab,CRTSE-Division CCSM- N°2;

    Laboratoire de Génie Chimique, Département de Chimie Industrielle, Université Saad Dahlab;

    Faculté de Génie Mécanique et Génie des Procédés, Université des Sciences et de la Technologie Houari Boumediene;

    CRTSE-Division CCSM- N°2;

    Faculté de Génie Mécanique et Génie des Procédés, Université des Sciences et de la Technologie Houari Boumediene;

    Faculté de Génie Mécanique et Génie des Procédés, Université des Sciences et de la Technologie Houari Boumediene;

    CRTSE-Division CCSM- N°2;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Semiconductor wastewater; H2O2containing wastewater; EDTA; Photo-electrochemical peroxidation;

    机译:半导体废水;H2O2废水;EDTA;光电化学过氧化;

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