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Conversion coating distribution on rough substrates analyzed by combining surface analytical techniques

机译:通过组合表面分析技术分析粗基质上的转化涂层分布

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摘要

In order to describe the chemical composition and the distribution of a thin trivalent chromium conversion coating on rough electrodeposited Zn-based alloy substrate, a methodology combining surface analytical and sputtering techniques was used. A sputtering by argon in glow discharge optical emission spectrometry (GD-OES) and by oxygen using time-of-flight secondary ion mass spectrometry (ToF-SIMS) were used to monitor the in-depth chemical composition evolution of the conversion coating and define the metal-conversion coating interface. Surface topography measurements were performed by high resolution 3D optical microscope. The chemical characterization of the conversion coating on the top surface and near the rough metal-oxide interface inside the craters was performed by X-ray photoelectron spectroscopy. The local depth and composition of the conversion layer inside and outside the craters were performed by Auger electron spectroscopy nanoprobe equipped with coaxial detector to prevent from shadowing effect during measurement. The results indicated inhomogeneous sputtering inside the ToF-SIMS craters, which was attributed to the shadowing effect, caused by the roughness of the substrate and the 45° incidence angle ion gun. GD-OES sputtering appeared homogeneous in different areas inside the crater despite the roughness of the substrate, which was attributed to the perpendicular incidence angle of the sputtering.
机译:为了描述化学成分和薄三价铬转化涂层对粗电沉积的Zn基合金基底的分布,使用了组合表面分析和溅射技术的方法。通过氩气在辉光放电光学发射光谱法(GD-OES)中的溅射和使用飞行时间二次离子质谱(TOF-SIMS)的氧气来监测转化涂层的深入化学成分演变并限定金属转化涂层界面。表面形貌测量由高分辨率3D光学显微镜进行。通过X射线光电子能谱进行顶表面和粗氧化物界面内的转换涂层和粗金属氧化物界面附近的化学表征。通过配备有同轴探测器的螺旋钻电子光谱纳米孔进行凹槽内和外部的转换层的局部深度和组成,以防止在测量期间的阴影效果。结果表明TOF-SIMS陨石坑内的不均匀溅射,其归因于基板的粗糙度和45°入射角离子枪引起的遮蔽效果。 GD-OES溅射在火山口内的不同区域中出现均匀,尽管基板的粗糙度粗糙度,其归因于溅射的垂直入射角。

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  • 来源
    《Applied Surface Science》 |2021年第1期|149734.1-149734.12|共12页
  • 作者单位

    Chimie ParisTech-CNRS PSL Research University Institut de Recherche de Chimie Paris (IRCP) 11 rue Pierre et Marie Curie 75005 Paris France;

    Chimie ParisTech-CNRS PSL Research University Institut de Recherche de Chimie Paris (IRCP) 11 rue Pierre et Marie Curie 75005 Paris France;

    Chimie ParisTech-CNRS PSL Research University Institut de Recherche de Chimie Paris (IRCP) 11 rue Pierre et Marie Curie 75005 Paris France;

    CNRS Université de Bordeaux PLACAMAT UMS 3626 F-33600 Pessac France;

    Chimie ParisTech-CNRS PSL Research University Institut de Recherche de Chimie Paris (IRCP) 11 rue Pierre et Marie Curie 75005 Paris France;

    Chimie ParisTech-CNRS PSL Research University Institut de Recherche de Chimie Paris (IRCP) 11 rue Pierre et Marie Curie 75005 Paris France;

    Chimie ParisTech-CNRS PSL Research University Institut de Recherche de Chimie Paris (IRCP) 11 rue Pierre et Marie Curie 75005 Paris France;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Buried interfaces; Shadowing effect; Sputtering; Thin Cr(III) conversion coating; ZnNi alloy;

    机译:埋地界面;遮蔽效果;溅射;薄Cr(iii)转化涂层;Znni合金;

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