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High-speed galvanostatic anodizing without oxide burning using a nanodimpled aluminum surface for nanoporous alumina fabrication

机译:使用纳米氮化铝表面进行纳米多孔氧化铝制造的纳米二叠氮铝表面,高速镀锌阳极氧化无氧化物氧化

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摘要

Rapid formation of a porous alumina film without oxide burning was achieved by anodizing in etidronic acid at large current densities using a nanodimpled aluminum surface. After the electropolished aluminum specimens were galvanostatically anodized in a 0.3 M etidronic acid solution at 293 K, a uniform porous alumina film without oxide burning was formed at relatively low current densities of up to 20 Am-2. After the first anodizing process, an array of dimples was fabricated on the aluminum surface by oxide film removal in a chromic acid/phosphoric acid solution. After the nanostructured aluminum specimen was galvanostatically anodized once again under the same conditions, the possible applied current density without burning increased with the size of the nanodimples, and the current density during the high-speed anodizing process of the dimpled aluminum specimen increased by five times. Many pores grew on the whole surface of the aluminum dimples from the initial anodizing stage; then, pores that grew from the bottom of the dimples survived the anodizing process, and a clear porous alumina film was formed as the voltage reached the maximum value.
机译:使用纳米二叠氮铝表面在大电流密度下在大铬酸阳极氧化阳极氧化氧化物而没有氧化物燃烧的多孔氧化铝膜的快速形成。在电抛光铝样品在293k下在0.3μs的乙酸溶液中镀锌阳极氧化后,在高达20AM-2的相对低的电流密度下形成均匀的多孔氧化铝膜。在第一次阳极氧化过程之后,通过在铬酸/磷酸溶液中除去铝表面上在铝表面上制造圆形阵列。在纳米结构铝样品再次在相同的条件下再次镀锌后,可能施加的电流密度随着纳米半块的尺寸而增加而不会燃烧,并且凹陷铝样品的高速阳极氧化过程中的电流密度增加了五次。许多孔隙在初始阳极氧化阶段的铝凹槽的整个表面上成长;然后,从凹坑的底部生存的孔存活阳极氧化过程,并且形成透明的多孔氧化铝膜,因为电压达到最大值。

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