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The effect of N-doped form on visible light photoactivity of Z-scheme g-C_3N_4/TiO_2 photocatalyst

机译:氮掺杂形式对Z型g-C_3N_4 / TiO_2光催化剂可见光光活性的影响

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The reasons for the difference of visible light activity between the direct contact g-C3N4/TiO2 Z-scheme composites obtained by one-step or two-step calcination process were investigated in detail by XRD, TEM, XPS, Raman and ESR technologies. TEM results showed that only g-C3N4 obtained by two-step calcination (denoted as CN-TSC) presented the porous structure which was in favor of the light absorption. XPS analysis indicated that interstitial doped N species formed in one-step calcination composite (denoted as CT-OSC) while substitutional N would appear in two-step calcination composite (denoted as CT-TSC). Nevertheless, interstitial N located at the higher position in the band gap of TiO2 and usually acted as the strong capture center of holes which was unfavorable to charge transfer. ESR and Raman results indicated that CT-TSC with some concentration of surface V-o center dot and lower concentration of bulk V-o center dot had excellent charge separation efficiency, according to the surface-enhanced Raman scattering (SERS) results of photo-induced charge-transfer (PICT) enhancement mechanism. And as a result, the visible-light activity for propylene oxidation of CT-TSC was twice higher than that of CT-OSC.
机译:通过XRD,TEM,XPS,Raman和ESR技术详细研究了通过一步或两步煅烧工艺获得的直接接触式g-C3N4 / TiO2 Z型复合材料可见光活性差异的原因。 TEM结果表明,仅通过两步煅烧获得的g-C3N4(称为CN-TSC)呈现出有利于光吸收的多孔结构。 XPS分析表明,在一步煅烧复合材料(称为CT-OSC)中形成了间隙掺杂的N物种,而在两步煅烧复合材料(称为CT-TSC)中出现了替代N。然而,间隙氮位于TiO2带隙中较高的位置,通常充当空穴的强捕获中心,不利于电荷转移。 ESR和Raman结果表明,根据光诱导电荷转移的表面增强拉曼散射(SERS)结果,具有一定浓度的表面Vo中心点和较低的整体Vo中心点的CT-TSC具有优异的电荷分离效率。 (PICT)增强机制。结果,CT-TSC对丙烯氧化的可见光活性比CT-OSC高两倍。

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