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IR and SFM study of PTCDA thin films on different substrates

机译:不同基材上PTCDA薄膜的IR和SFM研究

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FT-IR spectroscopy and SFM were used to investigate the growth of thin films of the organic semiconductor 3,4,9,10-perylenetetracarboxylicdianhydride (PTCDA) deposited by vacuum sublimation onto various substrates, i.e. Ag(111) layers on mica, KBr(100), mica, oxidized Si, and TiO2 nanoparticles on Si. Layer thicknesses of PTCDA varied from 10 to 1500 rim. The anhydride vibrations of PTCDA differ for the used substrates, which can be connected to the orientation of the molecules relative to the substrate surface and the film morphology as detected in the SFM pictures. (c) 2005 Elsevier B.V. All rights reserved.
机译:FT-IR光谱和SFM用于研究通过真空升华沉积到云母上的Ag(111)层,KBr( 100),云母,氧化的Si和Si上的TiO2纳米颗粒。 PTCDA的层厚度从10到1500 rim不等。 PTCDA的酸酐振动因所用基材而异,这可以与分子相对于基材表面的取向以及SFM图片中检测到的薄膜形态有关。 (c)2005 Elsevier B.V.保留所有权利。

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