首页> 外文期刊>Applied Surface Science >Effects of in situ thermal annealing on the structural, optical, and electrical properties in Hg0.7Cd0.3Te epilayers grown on CdTe buffer layers
【24h】

Effects of in situ thermal annealing on the structural, optical, and electrical properties in Hg0.7Cd0.3Te epilayers grown on CdTe buffer layers

机译:原位热退火对CdTe缓冲层上生长的Hg0.7Cd0.3Te外延层的结构,光学和电学性质的影响

获取原文
获取原文并翻译 | 示例
       

摘要

Scanning electron microscopy (SEM), Fourier transform infrared (FTIR) transmission, and Hall effect measurements were performed to investigate the structural, optical, and electrical properties of as-grown and in situ-annealed Hg0.7Cd0.3Te epilayers grown on CdTe buffer layers by using molecular beam epitaxy. After the Hg0.7Cd0.3Te epilayers had been annealed in a Hg-cell flux atmosphere, the SEM images showed that the surface morphologies of the Hg0.7Cd0.3Te thin films were mirror-like with no indication of pinholes or defects, and the FTIR spectra showed that the transmission intensities had increased in comparison to that of the as-grown Hg0.7Cd0.3Te epilayer. Hall-effect measurements showed that n-Hg0.7Cd0.3Te epilayers were converted to p-Hg0.7Cd0.3Te epilayers. These results indicate that the surface, optical, and electrical proper-ties of the Hg1-xCdxTe epilayers are improved by annealing and that as-grown n-Hg1-xCdxTe epilayers can be converted to p-Hg1-xCdxTe epilayers by in situ annealing. (c) 2006 Elsevier B.V. All rights reserved.
机译:进行了扫描电子显微镜(SEM),傅立叶变换红外(FTIR)透射和霍尔效应测量,以研究在CdTe缓冲液上生长的原位退火Hg0.7Cd0.3Te外延层的结构,光学和电学性质。通过使用分子束外延层。 Hg0.7Cd0.3Te外延层在Hg-cell助熔剂气氛中退火后,SEM图像显示Hg0.7Cd0.3Te薄膜的表面形态为镜面状,没有针孔或缺陷的迹象,并且FTIR光谱表明,与刚生长的Hg0.7Cd0.3Te外延层相比,透射强度有所增加。霍尔效应测量表明,n-Hg0.7Cd0.3Te外延层已转化为p-Hg0.7Cd0.3Te外延层。这些结果表明,通过退火可以改善Hg1-xCdxTe外延层的表面,光学和电学性能,并且可以通过原位退火将生长的n-Hg1-xCdxTe外延层转变为p-Hg1-xCdxTe外延层。 (c)2006 Elsevier B.V.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号