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Strong composition-dependent variation of MCs+ calibration factors in TiOx and GeOx (x <= 2) films

机译:TiOx和GeOx(x <= 2)薄膜中MCs +校准因子的成分依赖性强变化

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The emission of MCs+ secondary ions (M designates the analyte species) from TiOx (0.2 <= x <= 2) and GeO. (0.001 <= x <= 0.8) films under Cs+ bombardment was examined. The relative calibration factors of OCs+/TiCs+ and OCs+/GeCs+ were determined and were found to depend pronouncedly on the O/Ti and O/Ge atomic concentration ratios. Specifically, with increasing oxygen content OCs+ ions form much more efficiently (as compared to TiCs+ or GeCs+ ions), an enhancement amounting to more than a factor of 10 for the highest oxygen concentrations. Concurrently, the formation of TiOCs+ or GeOCs+ ions increases drastically. For both oxide systems, an empirical relation for the oxygen-concentration dependence of the relative calibration factors could be established. (c) 2006 Published by Elsevier B.V.
机译:TiOx(0.2 <= x <= 2)和GeO发出MCs +次级离子(M表示分析物种类)。检查了在Cs +轰击下的(0.001 <= x <= 0.8)膜。确定了OCs + / TiCs +和OCs + / GeCs +的相对校准因子,发现它们明显取决于O / Ti和O / Ge原子浓度比。具体而言,随着氧含量的增加,OCs +离子的形成效率更高(与TiCs +或GeCs +离子相比),对于最高的氧浓度,其增强作用超过10倍。同时,TiOCs +或GeOCs +离子的形成急剧增加。对于两种氧化物体系,可以建立相对校准因子的氧浓度依赖性的经验关系。 (c)2006年由Elsevier B.V.发布

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