首页> 外文期刊>Applied Surface Science >Magnetoresistance Of Magnetite Thin Films Grown By Pulsed Laser Deposition On Gaas(1 0 0) And Al_2o_3(0 0 0 1)
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Magnetoresistance Of Magnetite Thin Films Grown By Pulsed Laser Deposition On Gaas(1 0 0) And Al_2o_3(0 0 0 1)

机译:Gaas(1 0 0)和Al_2o_3(0 0 0 1)上脉冲激光沉积生长的磁铁矿薄膜的磁阻

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摘要

Magnetotransport properties of magnetite thin films deposited on gallium arsenide and sapphire substrates at growth temperatures between 473 and 673 K are presented. The films were grown by UV pulsed laser ablation in reactive atmospheres of O_2 and Ar, at working pressure of 8 × 10~(-2) Pa. Film stoichiometry was determined in the range from Fe_(2.95)O_4 to Fe_(2.97)O_4. Randomly oriented polycrystalline thin films were grown on GaAs(1 0 0) while for the Al_2O_3(0 0 0 1) substrates the films developed a (1 1 1) preferred orientation. Interfacial Fe~(3+) diffusion was found for both substrates affecting the magnetic behaviour. The temperature dependence of the resistance and magnetoresistance of the films were measured for fields up to 6 T. Negative magnetoresistance values of ~5% at room temperature and ~10% at 90 K were obtained for the as-deposited magnetite films either on GaAs(1 0 0) or Al_2O_3(0 0 0 1).
机译:提出了在473和673 K之间的生长温度下,沉积在砷化镓和蓝宝石衬底上的磁铁矿薄膜的磁传输特性。在8×10〜(-2)Pa的工作压力下,在O_2和Ar的反应气氛中通过紫外脉冲激光烧蚀法生长膜。在Fe_(2.95)O_4到Fe_(2.97)O_4的范围内确定膜的化学计量。 。随机取向的多晶薄膜生长在GaAs(1 0 0)上,而对于Al_2O_3(0 0 0 1)衬底,该薄膜表现出(1 1 1)优先取向。在影响磁性的两种基质中都发现了Fe〜(3+)的界面扩散。在高达6 T的磁场下测量了薄膜的电阻和磁阻的温度依赖性。在GaAs上沉积的磁铁矿薄膜在室温下的负磁阻值为5%,在90 K下的磁阻为-10%。 1 0 0)或Al_2O_3(0 0 0 1)。

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