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Aes, Eels And Trim Investigation Of Insb And Inp Compounds Subjected To Ar~+ Ions Bombardment

机译:Ar〜+离子轰击的Insb和Inp化合物的Aes,鳗鱼和修剪研究

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The interaction of ions with matter plays an important role in the treatment of material surfaces. In this paper we study the effect of argon ion bombardment on the InSb surface in comparison with the InP one. The Ar~+ ions, accelerated at low energy (300 eV) lead to compositional and structural changes in InP and InSb compounds. The InP surface is more sensitive to Ar~+ ions than that of InSb. These results are directly inferred from the qualitative Auger electron spectra (AES) and electron energy loss spectroscopy (EELS) analysis. However, these techniques alone do not allow us to determine with accuracy the disturbed depth in Ar~+ ions of InP and InSb compounds. For this reason, we combine AES and EELS with the simulation method TRIM (transport and range of ions in matter) to show the mechanism of interaction between the ions and the InP or InSb and hence determine the disturbed depth as a function of Ar~+ energy.
机译:离子与物质的相互作用在材料表面处理中起着重要作用。与InP相比,本文研究了氩离子轰击对InSb表面的影响。在低能量(300 eV)下加速的Ar〜+离子导致InP和InSb化合物的成分和结构发生变化。 InP表面比InSb对Ar〜+离子更敏感。这些结果是直接从定性俄歇电子能谱(AES)和电子能量损失能谱(EELS)分析中得出的。但是,仅靠这些技术并不能使我们准确地确定InP和InSb化合物的Ar〜+离子的受干扰深度。因此,我们将AES和EELS与模拟方法TRIM(物质中离子的传输和范围)结合起来,以显示离子与InP或InSb之间相互作用的机理,从而确定受干扰深度与Ar〜+的关系。能源。

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