Structure and properties of (AlCrMnMoNiZrB0.i )NX coatings prepared by reactive DC sputtering

摘要

The microstructure and properties of AlCrMnMoNiZrB0.1 nitride films prepared by reactive direct current sputtering at various N2-to-Ar flow ratios (R_N) were investigated. The films had an amorphous structure at low R_N and a face-centered cubic structure at a high R_N. As the R_N increased, the decrease in clusters and defects resulted in a dense columnar structure and low surface roughness. The peak hardness and modulus of the nitride films were 10.3 and 180GPa, respectively. The enhanced hardness is ascribed to the increased metal-nitrogen bonding, solid solution strengthening of several metallic nitrides, and lattice strain. The nitride films deposited at R_N = 0.2,0.5, and 0.8 had friction coefficients of 0.16,0.12 and 0.15, respectively. Wear-out failure occurred within 400 s when R_N = 0 and 1.0. Adhesive wear was the dominant wear mechanism.