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A study on structural, optical and hydrophobic properties of oblique angle sputter deposited HfO_2 films

机译:斜角溅射沉积HfO_2薄膜的结构,光学和疏水性能研究

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摘要

HfO_2 thin films have been synthesized by oblique angle reactive DC magnetron sputtering technique. Present study reports the effect of deposition angle on the hydrophobic, structural, surface morphological and optical properties of HfO_2 thin films. All the films were deposited at room temperature. HfO_2 thin films were found to possess monoclinic crystal structure. Significant changes in topography of the films, with change in deposition angle, have been observed. Surface roughness increases with decrease in deposition angle as observed from AFM image analysis. UV-vis spectroscopy has been used to study the optical properties of the films. Small changes in transmission and refractive index have been observed. The films are hydrophobic in nature and the contact angle is strongly influenced by deposition angle due to change in its surface roughness. Contact angle of 106.3° has been achieved for deposition angle of 30° which is highest so far for HfO_2 thin films prepared by magnetron sputtering. The results of this study reflect that contact angle of the films can be tuned by deposition angle. Good optical transmission along with hydrophobic character make HfO_2 thin films of great use as optical coatings for lenses, windshields and optoelectronic devices.
机译:通过斜角反应直流磁控溅射技术合成了HfO_2薄膜。目前的研究报道了沉积角对HfO_2薄膜的疏水性,结构,表面形态和光学性质的影响。所有膜均在室温下沉积。发现HfO_2薄膜具有单斜晶体结构。已经观察到膜的形貌随沉积角的变化而显着变化。从AFM图像分析可以看出,表面粗糙度随着沉积角的减小而增加。紫外可见光谱已用于研究膜的光学性质。已经观察到透射率和折射率的微小变化。膜本质上是疏水的,并且由于其表面粗糙度的变化,接触角受到沉积角的强烈影响。对于30°的沉积角已经实现了106.3°的接触角,这对于通过磁控溅射制备的HfO_2薄膜来说是迄今为止最高的。这项研究的结果表明,可以通过沉积角来调整薄膜的接触角。 HfO_2薄膜具有良好的透光性和疏水性,因此非常适合用作镜片,挡风玻璃和光电设备的光学涂层。

著录项

  • 来源
    《Applied Surface Science》 |2013年第15期|332-338|共7页
  • 作者单位

    Nano Science Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667, India;

    Nano Science Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667, India;

    Nano Science Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667, India;

    Department of Physics, University of Petroleum & Energy Studies, Dehradun, Uttarakhand 248007, India;

    Nano Science Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667, India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Sputtering; HfO_2 thin films; Hydrophobic; AFM; UV-vis spectrophotometer;

    机译:溅射;HfO_2薄膜;疏水性原子力显微镜紫外可见分光光度计;

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