机译:调制周期和调制比对多弧离子镀TiBN / CrN涂层结构和力学性能的影响
Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China;
Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China;
Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China;
Wuhan Univ, Sch Power & Mech Engn, Wuhan 430072, Peoples R China;
Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China;
Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China;
Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China;
Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China|Acad Sci Uzbek, Inst Ion Plasma & Laser Technol, Tashkent 700135, Uzbekistan;
Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China;
TiBN/CrN multilayer; Cathodic arc ion plating; Modulation period; Modulation ratio;
机译:调制时间对多弧离子镀TiBN / TiN纳米多层膜微结构和力学性能的影响
机译:调节期对直流磁控溅射沉积WB2 / CRN膜结构和力学性能的影响
机译:多弧离子镀CrCrAlAlN / TiAlN复合涂层的结构与力学性能
机译:通过改变低频调制熔体来控制沉积耐磨涂层的结构和性能
机译:溅射沉积Cr / CrN涂层的加工结构与性能的关系。
机译:具有各种调制周期的无定形TIBN / ALCRYN多层涂层的沉积和性质
机译:调制时间对纳米级W / ZrB2多层涂层结构和力学性能的影响