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In-situ XPS analysis of oxidized and reduced plasma deposited ruthenium-based thin catalytic films

机译:氧化和还原的等离子体沉积钌基薄催化膜的原位XPS分析

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A novel in-situ study of the surface molecular structure of catalytically active ruthenium-based films subjected to the oxidation (in oxygen) and reduction (in hydrogen) was performed in a Cat-Cell reactor combined with a XPS spectrometer. The films were produced by the plasma deposition method (PEMOCVD). It was found that the films contained ruthenium at different oxidation states: metallic (Ru-0), RuO2 (Ru+4), and other RuOx (Ru+X), of which content could be changed by the oxidation or reduction, depending on the process temperature. These results allow to predict the behavior of the Ru-based catalysts in different redox environments. (C) 2017 Elsevier B.V. All rights reserved.
机译:在结合XPS光谱仪的Cat-Cell反应器中,进行了氧化(在氧气中)和还原(在氢气中)的催化活性钌基薄膜表面分子结构的新颖原位研究。膜通过等离子体沉积法(PEMOCVD)生产。发现薄膜包含不同氧化态的钌:金属(Ru-0),RuO2(Ru + 4)和其他RuOx(Ru + X),其含量可通过氧化或还原而改变,具体取决于工艺温度。这些结果允许预测Ru基催化剂在不同氧化还原环境中的行为。 (C)2017 Elsevier B.V.保留所有权利。

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