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Effect of morphology evolution on the thermoelectric properties of oxidized ZnO thin films

机译:形态演变对氧化ZnO薄膜热电性能的影响

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摘要

Graphical abstractDisplay OmittedHighlightsSurface morphology of ZnO is controlled by hexagonal and polyhedral morphologies of Zn film.Existence of nanowires leads a low concentration of oxygen vacancy in ZnO film.Optimized power factor is obtained in ZnO film with c-axis preferred nanowire.Effect of nanowire magnitude on band gap is greater than that of diameter.AbstractThe effects of nanowire content on the thermoelectric properties of ZnO films were investigated. The nanowire content of ZnO films was tuned by thermal oxidation of evaporated Zn films. The results showed that hexagonal and polyhedral morphologies on the surface of Zn films can be used to tune the nanowire content of ZnO films. Hexagonal nanoplates with a diameter of 100–350nm readily grew ZnO nanowires with c-axis preferential orientation. Conversely, it was difficult to grow nanowires on polyhedral nanoparticles with diameters of 500–750nm because the meeting of ZnO (101) and (001) facets suppressed nanowire growth. Thermoelectric parameters were strongly affected by nanowire content. In particular, carrier concentration increased with nanowire content. Carrier mobility also increased with nanowire content because the nanowires behaved as channels for electronic migration. The band gap of the films narrowed with increasing nanowire content because the binding energy of O 1s electrons with oxygen vacancies decreased. The maximum power factor of the film with high nanowire content (8.80μW/mK2at 530K) was approximately 300% higher than that of the film with low nanowire content.
机译: 图形摘要 < ce:simple-para>省略显示 突出显示 ZnO的表面形态由Zn膜的六边形和多面体形态控制。 < ce:para id =“ par0010” view =“ all”>纳米线的存在导致低浓度的氧合 在具有c轴首选纳米线的ZnO薄膜中获得了最佳功率因数。 纳米线幅度对带隙的影响大于直径。 摘要 效果研究了纳米线含量对ZnO薄膜热电性能的影响。 ZnO薄膜的纳米线含量通过蒸发的Zn薄膜的热氧化来调节。结果表明,Zn薄膜表面的六边形和多面体形态可用于调节ZnO薄膜的纳米线含量。直径为100-350nm的六角形纳米板易于生长具有c轴优先取向的ZnO纳米线。相反,由于ZnO(101)和(001)面的相遇抑制了纳米线的生长,因此难以在直径为500-750nm的多面体纳米粒子上生长纳米线。热电参数受纳米线含量的强烈影响。特别地,载流子浓度随纳米线含量而增加。载流子迁移率也随着纳米线含量的增加而增加,因为纳米线充当电子迁移的通道。随着纳米线含量的增加,薄膜的带隙变窄,这是因为O 1s电子与氧空位的结合能降低了。纳米线含量高的薄膜的最大功率因数(530K时为8.80μW/ mK 2 )比低纳米线含量的薄膜的最大功率因数高约300% 。

著录项

  • 来源
    《Applied Surface Science》 |2018年第1期|354-361|共8页
  • 作者单位

    Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University,School of Materials Science and Engineering, Northeastern University;

    Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University;

    Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University,School of Materials Science and Engineering, Northeastern University;

    Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University;

    Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University,School of Materials Science and Engineering, Northeastern University;

    Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Thin film; Thermoelectric material; ZnO; Surface morphology; Thermal oxidation;

    机译:薄膜;热电材料;ZnO;表面形貌;热氧化;

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