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Fabrication and gas sensing properties of vertically aligned Si nanowires

机译:垂直排列的硅纳米线的制备和气敏特性

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摘要

In this study, a peculiar configuration for a gas sensor consisting of vertically aligned silicon nanowires (VA-Si NWs) synthesized by metal-assisted chemical etching (MACE) is reported. Si NWs were prepared via a facile MACE method and subsequent thermal annealing. Etching was performed by generation of silver nanoparticles (Ag NPs) and subsequent etching in HF/H2O2 aqueous solution; the growth conditions were optimized by changing the process parameters. Highly vertically oriented arrays of Si NWs with a straight-line morphology were obtained, and a top-top electrode configuration was applied. The VA-Si NW gas sensor showed good sensing performance, and the VA-Si NWs exhibited a remarkable response (R-g/R-a = 11.5 similar to 17.1) to H-2 gas (10-50 ppm) at 100 degrees C which was the optimal working temperature. The formation mechanism and gas sensing mechanism of VA-Si NWs are described. The obtained results can suggest new approaches to making inexpensive, versatile, and portable sensors based on Si NWs having a novel top-top electrode structure that are fully compatible with well-developed Si technologies. (c) 2017 Elsevier B.V. All rights reserved.
机译:在这项研究中,报告了一种气体传感器的特殊配置,该传感器由通过金属辅助化学蚀刻(MACE)合成的垂直排列的硅纳米线(VA-Si NWs)组成。通过简便的MACE方法和随后的热退火制备了Si NW。通过产生银纳米颗粒(Ag NPs)并随后在HF / H2O2水溶液中进行蚀刻来进行蚀刻;通过改变工艺参数优化了生长条件。获得具有直线形态的高度垂直取向的Si NW的阵列,并且应用顶-顶电极配置。 VA-Si NW气体传感器显示出良好的感测性能,并且VA-Si NW在100摄氏度时对H-2气体(10-50 ppm)表现出显着的响应(Rg / Ra = 11.5,类似于17.1)。最佳工作温度。描述了VA-Si NW的形成机理和气敏机理。所获得的结果可以提出新的方法来制造基于Si NW的廉价,通用和便携式传感器,该传感器具有与发达的Si技术完全兼容的新型顶-顶电极结构。 (c)2017 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Applied Surface Science》 |2018年第ptab期|215-226|共12页
  • 作者单位

    Hanyang Univ, Res Inst Ind Sci, Seoul 133791, South Korea;

    Hanyang Univ, Div Mat Sci & Engn, Seoul 04763, South Korea;

    Kangwon Natl Univ, Dept Mat & Met Engn, 346 Joongang Ro, Samcheok 25913, Gangwon Do, South Korea;

    Hanyang Univ, Div Mat Sci & Engn, Seoul 04763, South Korea;

    Hanyang Univ, Div Mat Sci & Engn, Seoul 04763, South Korea;

    Hanyang Univ, Div Mat Sci & Engn, Seoul 04763, South Korea;

    Inha Univ, Dept Mat Sci & Engn, Incheon 402751, South Korea;

    Hanyang Univ, Res Inst Ind Sci, Seoul 133791, South Korea|Hanyang Univ, Div Mat Sci & Engn, Seoul 04763, South Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Silicon; Nanowires; Chemical etching; Gas sensors;

    机译:硅;纳米线;化学蚀刻;气体传感器;

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