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Relation between texture and critical current density of texturedYBa2Cu3Ox plates

机译:YBa2Cu3Ox织构板的织构与临界电流密度之间的关系

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Textured YBa2Cu3Ox plates show a significant spread in the critical current density up to 12.000 A/cm2 measured by direct transport current at 77 K. This spread is related to the crystalline texture of the material. Optical polarization microscopy is used for initial examination of crystal alignment and texture. We use synchrotron radiation at 100 keV to perform x-ray diffraction measurements to obtain quantitative information about the texture. The crystallographic (110)-direction is found to be preferentially along the slab and the c-axis is parallel to the largest face. DC-magnetization is used to measure the magnetization critical current density of pieces cut around each x-ray measurement point. The results from x-ray diffraction, optical microscopy and magnetization critical current density are compared to the transport critical current density. The magnetization critical current is found to decrease exponentially with the in-plane texture
机译:织构化的YBa2Cu3Ox板在77 K处通过直接传输电流测得的临界电流密度高达12.000 A / cm2的显着扩展。这种扩展与材料的晶体织构有关。光学偏振显微镜用于晶体取向和织构的初步检查。我们使用100 keV的同步加速器辐射进行X射线衍射测量,以获得有关纹理的定量信息。发现晶体学(110)方向优先沿着平板,并且c轴平行于最大面。直流磁化用于测量在每个X射线测量点周围切割的工件的磁化临界电流密度。将X射线衍射,光学显微镜和磁化临界电流密度的结果与传输临界电流密度进行比较。发现磁化临界电流随面内纹理呈指数下降

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