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Comparative study of I-V methods to extract Au/FePc/p-Si Schottky barrier diode parameters

机译:I-V方法提取Au / FePc / p-Si肖特基势垒二极管参数的比较研究

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摘要

So far, various methods have been proposed to extract the Schottky diode parameters from measured current-voltage characteristics. In this work, Schottky barrier diode with structure of Au/2(3),9(10),16(17),23(24)-tetra(4-(4-mefhoxyphenyl)-8-methylcoumarin-7 oxy) phthalocyaninatoiron(II) (FePc)/p-Si was fabricated and current-voltage measurements were carried out on it. In addition, current-voltage measurements were also performed on Au/p-Si structure, without FePc, to clarify the influence of the presence of an interface layer on the device performance. The measured current-voltage characteristics indicate that the interface properties of a Schottky barrier diode can be controlled by the presence of an organic interface layer. It is found that the room temperature barrier height of Au/FePc/p-Si structure is larger than that of the Au/p-Si structure. The obtained forward bias current-voltage characteristics of the Au/FePc/p-Si device was analysed by five different analytical methods. It is found that the extracted values of SBD parameters strongly depends on the method used.
机译:迄今为止,已经提出了各种方法来从测量的电流-电压特性中提取肖特基二极管参数。在这项工作中,肖特基势垒二极管具有Au / 2(3),9(10),16(17),23(24)-四(4-(4-甲氧基苯基)-8-甲基香豆素-7氧基)酞菁基铁的结构(II)(FePc)/ p-Si被制造出来,并对其进行电流-电压测量。此外,还对没有FePc的Au / p-Si结构进行了电流-电压测量,以阐明界面层的存在对器件性能的影响。所测量的电流-电压特性表明,可以通过有机界面层的存在来控制肖特基势垒二极管的界面特性。发现Au / FePc / p-Si结构的室温势垒高度大于Au / p-Si结构的室温势垒高度。通过五种不同的分析方法对所获得的Au / FePc / p-Si器件的正向偏置电流-电压特性进行了分析。发现SBD参数的提取值强烈地取决于所使用的方法。

著录项

  • 来源
    《Applied Physics》 |2018年第1期|124:81.1-124:81.8|共8页
  • 作者

    Çiğdem Oruç; Ahmet Altmdal;

  • 作者单位

    Department of Physics, Faculty of Science and Art, Yıldız Technical University, Esenler, 34722 Istanbul, Turkey;

    Department of Physics, Faculty of Science and Art, Yıldız Technical University, Esenler, 34722 Istanbul, Turkey;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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