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Carrier thermalization under stimulated emission in In0.17Ga0.83N epilayer at room temperature

机译:室温下In 0.17 Ga 0.83 N外延层中激发发射下的载流子热化

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摘要

We elucidate a strong room temperature stimulated emission (SE) of InGaN epilayer grown by molecular beam epitaxy under the subpicosecond pulse excitation. The SE peak at 428 nm emerges on the higher energy side of the spontaneous emission in photoluminescence spectra when the excitation density exceeds the threshold of ∼3.68 mJ/cm. Nondegenerate transient differential reflectivity measurements show that a multi-stage carrier thermalization from excited states to localized edge states and stimulated emission dominate the decay processes of photogenerated carriers under various excitation densities. Our results indicate that the existence of phonon bottleneck effect could result in a slow thermalization process in the InGaN material even under the condition of stimulated emission.
机译:我们阐明了在亚皮秒脉冲激发下通过分子束外延生长的InGaN外延层的强室温激发发射(SE)。当激发密度超过〜3.68 mJ / cm的阈值时,在428 nm处的SE峰出现在光致发光光谱中自发发射的较高能量侧。非简并的瞬态差分反射率测量结果表明,从激发态到局部边缘态以及受激发射的多阶段载流子热化在不同激发密度下主导了光生载流子的衰减过程。我们的结果表明,即使在受激发射条件下,声子瓶颈效应的存在也可能导致InGaN材料中的缓慢热化过程。

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