首页> 外文期刊>Applied Physics Letters >Enhancing the ultraviolet response of silicon photodetectors using Yb~(3+)-doped CsPbCl_2Br nanocrystals glass with self-crystallization inhibited by ZnO
【24h】

Enhancing the ultraviolet response of silicon photodetectors using Yb~(3+)-doped CsPbCl_2Br nanocrystals glass with self-crystallization inhibited by ZnO

机译:使用Yb〜(3 +) - 掺杂CSPBCL_2BR纳米晶体玻璃具有ZnO抑制的自结晶的硅光电探测器的紫外响应

获取原文
获取原文并翻译 | 示例
       

摘要

All-inorganic CsPbX_3 (X = Cl, Br, I) perovskite nanocrystals (NCs) are the most promising next generation photoelectric materials owing to their excellent properties. Although embedding perovskite NCs into a glass matrix improves their stability, different applications require perovskite nanocrystal glasses (PNGs) with different properties. In this work, we controlled the network structure of the precursor glass by changing the content of ZnO (3.8-11.4 mol. %) in the raw materials, thus inhibiting the direct precipitation of CsPbCl_2Br NCs in the glass (i.e., the self-crystallization process), and obtained samples with local emission and high transmittance. In addition, we incorporated rare-earth (RE) Yb~(3+) into a CsPbCl_2Br PNG to achieve efficient ultraviolet (UV) to near-infrared quantum cutting emissions and boost the UV response of silicon photodetectors (PDs). Finally, after combining the Yb~(3+)-doped CsPbCl_2Br PNG on the Si PDs, the responsivity of the latter increased to 0.014 A/W at 320 nm, which is 14 times higher than that of the bare Si PDs. Moreover, Si PDs based on Yb~(3+)-doped CsPbCl_2Br PNG exhibited excellent photocurrent stability.
机译:全无机CSPBX_3(X = CL,BR,I)Perovskite纳米晶体(NCS)是由于其优异的性能而最具前进的光电材料。虽然将Perovskite NCS嵌入玻璃基质中提高了它们的稳定性,但不同的应用需要具有不同性质的钙钛矿纳米晶体眼镜(PNG)。在这项工作中,通过在原料中改变ZnO(3.8-11.4mol.4mol.%)的含量来控制前体玻璃的网络结构,从而抑制玻璃中Cspbcl_2br ncs的直接沉淀(即,自结晶过程),并获得具有局部发射和高透射率的样品。此外,我们将稀土(RE)YB〜(3+)纳入CSPBCL_2BR PNG,以实现高效的紫外线(UV)到近红外量子切割排放,并提高硅光电探测器(PDS)的UV响应。最后,在将Yb〜(3 +) - 掺杂CSPBCL_2BN PNG组合在Si Pds上之后,后者的响应度在320nm的320nm中增加到0.014 a / w,比裸Si pds高14倍。此外,基于Yb〜(3 +) - 掺杂CSPBCL_2BR PNG的Si Pds表现出优异的光电流稳定性。

著录项

  • 来源
    《Applied Physics Letters》 |2021年第14期|141905.1-141905.7|共7页
  • 作者单位

    College of Life and Environmental Science Wenzhou University Wenzhou 325035 China;

    Colleqe of Chemistry and Materials Engineering Wenzhou University Wenzhou 325035 China;

    College of Life and Environmental Science Wenzhou University Wenzhou 325035 China;

    Colleqe of Chemistry and Materials Engineering Wenzhou University Wenzhou 325035 China;

    College of Life and Environmental Science Wenzhou University Wenzhou 325035 China;

    Colleqe of Chemistry and Materials Engineering Wenzhou University Wenzhou 325035 China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号