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首页> 外文期刊>Applied Physics Letters >Tuning the linear field range of tunnel magnetoresistive sensor with MgO capping in perpendicular pinned double-interface CoFeB/MgO structure
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Tuning the linear field range of tunnel magnetoresistive sensor with MgO capping in perpendicular pinned double-interface CoFeB/MgO structure

机译:用MgO封端调节隧道磁阻传感器的线性场范围,在垂直固定的双界面CofeB / MgO结构中

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摘要

A double-interface CoFeB/MgO perpendicular tunnel magnetoresistance (p-TMR) structure has been proposed as a solution to improve the thermal stability of perpendicular magnetic tunnel junction (MTJ)-based devices. In this paper, we have investigated the performance of TMR film stacks by varying the thickness of the MgO cap layer. The resistance area (RA) product and TMR ratio are characterized using a current-in-plane tunneling system. Structural and physical analyses are performed using transmission electron microscopy and a superconducting quantum interference device. It is found that the sensing layer is able to exhibit a linear output and sensitivity up to 0.25% MR/Oe as the thickness of the MgO cap layer is lowered to 0.7 nm. The RA product increases as the thickness of the MgO cap layer decreases under 0.8 nm, which is attributed to oxidization of the CoFeB layer. This research provides a valuable direction to the optimization of double-interface CoFeB/MgO p-TMR and the sensor design in terms of linear magnetic field range and sensor RA product target for sensor applications.
机译:已经提出了一种双面接口CoFeB / MgO垂直隧道磁阻(P-TMR)结构作为提高垂直磁隧道结(MTJ)的器件的热稳定性的解决方案。在本文中,我们通过改变MgO盖层的厚度来研究TMR膜堆的性能。电阻区域(RA)产品和TMR比例使用电流型隧道系统的特征在于。使用透射电子显微镜和超导量子干涉装置进行结构和物理分析。发现感测层能够表现出线性输出和高达0.25%MR / OE的灵敏度,因为MgO盖层的厚度降低至0.7nm。由于MgO盖层的厚度下降0.8nm,Ra产物增加,这归因于CoFeB层的氧化。本研究提供了一种有价值的方向,以便在线磁场范围和传感器RA产品目标方面优化双界面CoFeB / MgO P-TMR和传感器设计。

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  • 来源
    《Applied Physics Letters》 |2021年第12期|122402.1-122402.5|共5页
  • 作者单位

    Beihang-Geortek Joint Microelectronics Institute Qingdao Research Institute Beihang University Qingdao 266104 China Fert Beijing Institute BDBC School of Microelectronics Beihang University Beijing 100191 China;

    School of Physics Shandong University Jinan 250100 China;

    Beihang-Geortek Joint Microelectronics Institute Qingdao Research Institute Beihang University Qingdao 266104 China;

    Beihang-Geortek Joint Microelectronics Institute Qingdao Research Institute Beihang University Qingdao 266104 China Fert Beijing Institute BDBC School of Microelectronics Beihang University Beijing 100191 China;

    School of Microelectronics Beihang University Beijing 100191 China;

    Beihang-Geortek Joint Microelectronics Institute Qingdao Research Institute Beihang University Qingdao 266104 China Fert Beijing Institute BDBC School of Microelectronics Beihang University Beijing 100191 China;

    Beihang-Geortek Joint Microelectronics Institute Qingdao Research Institute Beihang University Qingdao 266104 China;

    Beihang-Geortek Joint Microelectronics Institute Qingdao Research Institute Beihang University Qingdao 266104 China Fert Beijing Institute BDBC School of Microelectronics Beihang University Beijing 100191 China;

    Beihang-Geortek Joint Microelectronics Institute Qingdao Research Institute Beihang University Qingdao 266104 China Fert Beijing Institute BDBC School of Microelectronics Beihang University Beijing 100191 China;

    Beihang-Geortek Joint Microelectronics Institute Qingdao Research Institute Beihang University Qingdao 266104 China Goertek Inc. Weifang 261031 China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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