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Good piezoelectricity of self-polarized thick epitaxial (K,Na)NbO_3 films grown below the Curie temperature (240 °C) using a hydrothermal method

机译:使用水热法在居里温度(240℃)低于居里温度(240℃)的自极化厚外延(K,Na)NbO_3薄膜的良好压电性

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摘要

Using a hydrothermal method, (K_(0.88)Na_(0.12))NbO_3 films were deposited at 240 °C on (100)~cSrRuO_3//(100)SrTiO_3 substrates. Moreover, without any poling treatment, direct and inverse transverse piezoelectric coefficients, e_(3i,f), near 0kV/cm were approximately - 5.0C/m~2 for the as-deposited film. This value was nearly unchanged following the application of an electric field and poling treatment, suggesting that as-deposited films are almost in a fully self-polarized state without the application of an electric field. As-deposited films with a thickness of up to 22 showed constant piezoelectricity without any poling treatment. The films did not crack or peel because of substrates due to the small thermal strain originating from the low deposition temperature. The figures of merit (FOM) for the vibration energy harvester [FOM = e_(31,f)~2 /(ε_0ε_r)] and sensor [FOM = e_(31,f)/(ε_0ε_r)} were estimated to be good at 32.8 GPa and -5.9 GV/m, respectively, primarily because of the low relative dielectric constant of ~110. Furthermore, the piezoelectric voltage coefficient g_(31) [= d_(31)/(ε_0ε_r)] was estimated and demonstrated a high value of 0.073 Vm/N.
机译:使用水热法,(K_(0.88)NA_(0.12))NBO_3膜在240℃(100)〜CSRRO_3 //(100)SRTIO_3底物上沉积。此外,没有任何抛光处理,直接和反向横向压电系数,E_(3i,F),近0kV / cm的近0kV / cm为5.0℃/ m〜2,用于沉积膜。在施加电场和极化处理后,该值几乎不变,表明在不应用电场的情况下,沉积的薄膜几乎处于完全自极化状态。厚度为最多22的沉积薄膜显示恒定的压电,而无需任何抛配处理。由于源自低沉积温度的小的热应变,薄膜由于基材而不是裂缝或剥离。估计振动能量Harvester的优点(FOM)的数字(FOM)[FOM = E_(31,F)〜2 /(ε_0ε_R)]和传感器[FOM = e_(31,F)/(ε_0ε_R)}良好32.8 GPA和-5.9 GV / m,分别主要是因为〜110的相对介电常数低。此外,估计压电电压系数G_(31)[= D_(31)/(ε_0ε_R)]并证明高值0.073 VM / n。

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  • 来源
    《Applied Physics Letters》 |2020年第14期|142903.1-142903.5|共5页
  • 作者单位

    Department of Materials Science and Engineering Tokyo Institute of Technology Yokohama 226-8502 Japan;

    Department of Materials Science and Engineering Tokyo Institute of Technology Yokohama 226-8502 Japan;

    Department of Materials Science and Engineering Tokyo Institute of Technology Yokohama 226-8502 Japan;

    Department of Materials Science and Engineering Tokyo Institute of Technology Yokohama 226-8502 Japan Research Center for Functional Materials National Institute for Materials Science (NIMS) Tsukuba 305-0044 Japan;

    Department of Electrical and Electronic Engineering Tokyo Institute of Technology Yokohama 226-8502 Japan;

    Department of Electrical and Electronic Engineering Tokyo Institute of Technology Yokohama 226-8502 Japan;

    Department of Materials and Life Sciences Sophia University Tokyo 102-8554 Japan;

    Department of Institute for Materials Research Tohoku University Sendai 980-8577 Japan;

    Department of Institute for Materials Research Tohoku University Sendai 980-8577 Japan;

    Department of Institute for Materials Research Tohoku University Sendai 980-8577 Japan;

    Department of Physics and Electronics Osaka Prefecture University Osaka 599-8531 Japan;

    Department of Materials Science and Engineering Tokyo Institute of Technology Yokohama 226-8502 Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 22:18:03

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