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Scaling-down and interfacial effect to break down the trade-off between thermal stability and crystallization speed of the Sb_2Se films

机译:缩放和界面效应,分解SB_2SE膜的热稳定性和结晶速度之间的折衷

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摘要

Phase change memory (PCM) has been one of the most potential technologies for in-memory computing and neuromorphic integrated systems. It requires phase-change memory scaling toward higher density for such applications. However, the scaling-down and interfacial impact in phase-change materials, which are the core of PCMs, are still unclear. In this paper, the phase transition properties and crystallization behavior of phase-change material Sb_2Se were tuned intrinsically by reducing the thickness of the Sb_2Se film and coverage of VO_2. It is shown that the crystallization temperature increases from 209 °C to 224 °C, and 10-year data retention temperature enhances from 117 °C to 139 °C, as the thickness of the Sb_2Se film decreases from 50 nm to 2 nm. The coverage of VO_2 could improve the thermal stability and crystallization rate of the Sb_2Se film obviously, especially for smaller thickness. The kinetic exponent obtained by the JMA model indicates that the crystallization mechanism varies with film thickness, which could tune the crystallization rate of the Sb_2Se film. This study provides a practical solution for on-going optimizing phase-change properties in terms of size and interfacial effects.
机译:相变存储器(PCM)是内存中最潜在的内存技术和神经形态集成系统之一。它需要相变存储器缩放朝向这些应用的更高密度。然而,是PCMS核心的相变材料中的缩小和界面撞击仍然不清楚。在本文中,通过降低SB_2SE膜的厚度和VO_2的覆盖,本质上调谐相变材料SB_2SE的相变性和结晶行为。结果表明,结晶温度从209℃升高至224℃,10年的数据保持温度从117℃升高到139℃,因为Sb_2Se膜的厚度从50nm降低到2nm。 VO_2的覆盖范围可以显着提高SB_2SE膜的热稳定性和结晶速率,特别是对于较小的厚度。由JMA模型获得的动力学指数表明结晶机制随膜厚度而变化,这可以调节SB_2SE膜的结晶速率。本研究提供了一种实用的解决方案,用于在尺寸和界面效应方面进行持续优化相变性。

著录项

  • 来源
    《Applied Physics Letters》 |2020年第14期|141601.1-141601.5|共5页
  • 作者

    Tao Wang; Yegang Lu; Yang Li;

  • 作者单位

    Faculty of Electrical Engineering and Computer Science Key Laboratory of Photoelectric Materials and Devices of Zhejiang Province Ningbo University Zhejiang 315211 China;

    Faculty of Electrical Engineering and Computer Science Key Laboratory of Photoelectric Materials and Devices of Zhejiang Province Ningbo University Zhejiang 315211 China;

    Faculty of Electrical Engineering and Computer Science Key Laboratory of Photoelectric Materials and Devices of Zhejiang Province Ningbo University Zhejiang 315211 China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 22:17:53

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