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Dependence of transition behaviors on structure of Sb_(100-x)Er_x films for broadband nonvolatile optical memory

机译:转换行为对宽带非易失性光存储器的SB_(100-X)ER_X膜结构的依赖性

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摘要

The crystallization temperature (Tc) and 10-year data-retention temperature enhance from 176 degrees C to 217 degrees C and from 61.5 degrees C to 120.6 degrees C, respectively, when the Er concentration increases from 16 at. % to 28 at. % for Sb100-xErx films. The improvement in the thermal stability of the Sb100-xErx results from Er doping induced the suppression of the A(1g) mode from Sb-Sb bonds. The fast crystallization of the Sb100-xErx film is ascribed to the growth-dominated crystallization mechanism which was confirmed by the in situ microstructure observation. A large optical contrast of Sb100-xErx such as high ON/OFF ratios of both the refractive index (n) and the extinction coefficient (k) between the amorphous and crystalline states results from the formation of resonant bonding in crystalline states. Sb100-xErx demonstrated the repeatable and reversible phase change between two states induced by optical pulses, suggesting a potential candidate for optical storage. Published under license by AIP Publishing.
机译:当ER浓度从16开始增加时,结晶温度(Tc)和10年的数据保留温度分别从176℃至217摄氏度增强到61.5摄氏度至120.6摄氏度。 %到28。对于SB100-XERX薄膜的百分比。 SB100-XERX的热稳定性的提高来自ER掺杂诱导从SB-SB键的抑制A(1G)模式。 Sb100-xerx膜的快速结晶归因于通过原位微观结构观察证实的生长束缚的结晶机制。 Sb100-xerx的大光学对比,例如无定形和结晶状态之间的折射率(n)和消光系数(k)的高开/关差(折射系数(k)是由结晶状态中的共振键合的形成。 SB100-Xerx证明了光学脉冲引起的两个状态之间的可重复和可逆相变,表明光学存储的潜在候选者。通过AIP发布在许可证下发布。

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  • 来源
    《Applied Physics Letters》 |2019年第11期|111903.1-111903.5|共5页
  • 作者单位

    Ningbo Univ Key Lab Photoelect Mat & Devices Zhejiang Prov Fac Elect Engn & Comp Sci Ningbo 315211 Zhejiang Peoples R China;

    Ningbo Univ Key Lab Photoelect Mat & Devices Zhejiang Prov Fac Elect Engn & Comp Sci Ningbo 315211 Zhejiang Peoples R China;

    Chinese Acad Sci Shanghai Inst Opt & Fine Mech Lab Micronano Optoelect Mat & Devices Key Lab Mat High Power Laser Shanghai 201800 Peoples R China;

    Ningbo Univ Key Lab Photoelect Mat & Devices Zhejiang Prov Fac Elect Engn & Comp Sci Ningbo 315211 Zhejiang Peoples R China;

    Ningbo Univ Key Lab Photoelect Mat & Devices Zhejiang Prov Fac Elect Engn & Comp Sci Ningbo 315211 Zhejiang Peoples R China;

    Ningbo Univ Key Lab Photoelect Mat & Devices Zhejiang Prov Fac Elect Engn & Comp Sci Ningbo 315211 Zhejiang Peoples R China;

    Ningbo Univ Key Lab Photoelect Mat & Devices Zhejiang Prov Fac Elect Engn & Comp Sci Ningbo 315211 Zhejiang Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 22:17:43

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