...
首页> 外文期刊>Applied Physics Letters >Enhanced magnetic modulation in NiO-based memory device through ionic liquid pre-treatment
【24h】

Enhanced magnetic modulation in NiO-based memory device through ionic liquid pre-treatment

机译:通过离子液体预处理增强基于NiO的存储设备中的磁调制

获取原文
获取原文并翻译 | 示例
           

摘要

The electrical manipulation of magnetism is of particular importance owing to its potential applications in low-power memory devices and spintronics. In this study, we demonstrate enhanced magnetic modulation and an increased exchange bias field (H-EB) in NiO films pretreated with ionic liquid (IL), which we refer to as IL-NiO films. The saturation magnetization of the IL-NiO film in the low-resistance state (LRS) is more than 2.5 times than that in the high-resistance state; this value is more than 80% higher than that of the NiO film without IL pretreatment (As-NiO). In addition, the H-EB value of the IL-NiO film is more than 140% higher than that of the As-NiO film. Further analysis indicates that oxygen vacancies and metallic Ni-0 are introduced into the NiO film during the IL pretreatment process, which results in the formation of thicker ferromagnetic Ni conductive filaments (CFs) after the set process. These thicker Ni CFs enhance the magnetism of the IL-NiO film and increase the coupling area between the ferromagnetic Ni and antiferromagnetic NiO in the LRS, thus leading to a larger magnetic modulation and higher H-EB in the IL-NiO film. We believe that our findings can significantly contribute to further advancements in memory devices and allied applications.
机译:由于磁性的电操纵在低功率存储设备和自旋电子学中的潜在应用,因此特别重要。在这项研究中,我们证明了在用离子液体(IL)预处理的NiO膜中增强的磁调制和增加的交换偏置场(H-EB),我们将其称为IL-NiO膜。低电阻状态(LRS)的IL-NiO膜的饱和磁化强度是高电阻状态的2.5倍以上。该值比未经IL预处理(As-NiO)的NiO膜高80%以上。此外,IL-NiO膜的H-EB值比As-NiO膜的H-EB值高140%以上。进一步的分析表明,在IL预处理过程中,氧空位和金属Ni-0被引入到NiO膜中,这导致在凝固过程之后形成更厚的铁磁Ni导电丝(CFs)。这些更厚的Ni CFs增强了IL-NiO膜的磁性,并增加了LRS中铁磁Ni和反铁磁NiO之间的耦合面积,从而导致了IL-NiO膜中更大的磁调制和更高的H-EB。我们相信,我们的发现可以为存储设备和相关应用的进一步发展做出重大贡献。

著录项

  • 来源
    《Applied Physics Letters》 |2019年第10期|103501.1-103501.5|共5页
  • 作者单位

    Hebei Normal Univ Coll Phys Sci & Informat Engn Key Lab Adv Films Hebei Prov Shijiazhuang 050024 Hebei Peoples R China|Hebei GEO Univ Coll Math & Phys Shijiazhuang 050031 Hebei Peoples R China;

    Hebei Normal Univ Coll Phys Sci & Informat Engn Key Lab Adv Films Hebei Prov Shijiazhuang 050024 Hebei Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号