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Maximizing the quality factor to mode volume ratio for ultra-small photonic crystal cavities

机译:最大化超小型光子晶体腔的品质因数与模式体积比

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摘要

Small manufacturing-tolerant photonic crystal cavities are systematically designed using topology optimization to enhance the ratio between the quality factor and mode volume, Q/V. For relaxed manufacturing tolerance, a cavity with a bow-tie shape is obtained which confines light beyond the diffraction limit into a deep-subwavelength volume. Imposition of a small manufacturing tolerance still results in efficient designs, however, with diffraction-limited confinement. Inspired by numerical results, an elliptic ring grating cavity concept is extracted via geometric fitting. Numerical evaluations demonstrate that for small sizes, topology-optimized cavities enhance the Q/V-ratio by up to two orders of magnitude relative to standard L1 cavities and more than one order of magnitude relative to shape-optimized L1 cavities. An increase in cavity size can enhance the Q/V-ratio by an increase in the Q-factor without a significant increase in V. Comparison between optimized and reference cavities illustrates that significant reduction of V requires big topological changes in the cavity. Published by AIP Publishing.
机译:使用拓扑优化系统地设计了可容忍小型制造的光子晶体腔,以提高品质因数与模式体积Q / V之比。为了放松制造公差,获得了领结形状的空腔,该空腔将超出衍射极限的光限制在深亚波长的体积中。施加较小的制造公差仍可实现有效的设计,但是具有衍射限制的限制。受数值结果的启发,通过几何拟合提取了椭圆环形光栅腔的概念。数值评估表明,对于小尺寸,拓扑优化型腔相对于标准L1型腔可将Q / V比提高多达两个数量级,而相对于形状优化型L1腔则可提高一个以上数量级。腔尺寸的增加可以通过增加Q因子来提高Q / V比,而不会显着增加V。优化腔和参考腔之间的比较表明,V的显着减小要求腔中拓扑发生较大变化。由AIP Publishing发布。

著录项

  • 来源
    《Applied Physics Letters》 |2018年第24期|241101.1-241101.5|共5页
  • 作者单位

    Tech Univ Denmark, DTU Foton, Dept Photon Engn, DK-2800 Lyngby, Denmark;

    Tech Univ Denmark, Dept Mech Engn, Sect Solid Mech, DK-2800 Lyngby, Denmark;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 04:09:25

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